R. Sitte et al., RELAXATION OF ACCEPTANCE LIMITS (RAL) - A GLOBAL APPROACH FOR PARAMETRIC YIELD CONTROL OF 0.1-MU-M DEEP-SUBMICRON MOSFET DEVICES, IEEE transactions on semiconductor manufacturing, 8(3), 1995, pp. 374-377
An alternative method to fixed quality acceptance limits for in-line y
ield control is proposed. Our study is based on a sensitivity analysis
, which has revealed that conventional parametric yield-control techni
ques using fixed in-line acceptance (tolerance) limits, as traditional
ly used in semiconductor manufacturing, are not efficient in deep subm
icron-size devices.