T. Manku et L. Maceachern, A DC METHOD FOR MEASURING ALL THE GATE CAPACITORS IN MOS DEVICES WITHATTO-FARAD RESOLUTION, IEEE transactions on semiconductor manufacturing, 11(1), 1998, pp. 141-145
In this paper we present a new methodology for measuring all the intri
nsic gate capacitors (i.e., gate-source, gate-drain, and gate-bulk) in
a MOS device using a de measure ment scheme, The structure consists o
f two matched MOSFET's, one of which has a reference capacitor attache
d to its gate, The test structure was fabricated and the results show
a resolution in the atto-farads range, The test structures uses charge
coupling to measure the gate capacitors.