A DC METHOD FOR MEASURING ALL THE GATE CAPACITORS IN MOS DEVICES WITHATTO-FARAD RESOLUTION

Citation
T. Manku et L. Maceachern, A DC METHOD FOR MEASURING ALL THE GATE CAPACITORS IN MOS DEVICES WITHATTO-FARAD RESOLUTION, IEEE transactions on semiconductor manufacturing, 11(1), 1998, pp. 141-145
Citations number
8
Categorie Soggetti
Engineering, Eletrical & Electronic","Engineering, Manufacturing","Physics, Applied
ISSN journal
08946507
Volume
11
Issue
1
Year of publication
1998
Pages
141 - 145
Database
ISI
SICI code
0894-6507(1998)11:1<141:ADMFMA>2.0.ZU;2-1
Abstract
In this paper we present a new methodology for measuring all the intri nsic gate capacitors (i.e., gate-source, gate-drain, and gate-bulk) in a MOS device using a de measure ment scheme, The structure consists o f two matched MOSFET's, one of which has a reference capacitor attache d to its gate, The test structure was fabricated and the results show a resolution in the atto-farads range, The test structures uses charge coupling to measure the gate capacitors.