E. Delcastillo et Jy. Yeh, AN ADAPTIVE RUN-TO-RUN OPTIMIZING CONTROLLER FOR LINEAR AND NONLINEARSEMICONDUCTOR PROCESSES, IEEE transactions on semiconductor manufacturing, 11(2), 1998, pp. 285-295
This paper presents a new run-to-run (R2R) multiple-input-multiple-out
put controller for semiconductor manufacturing processes. The controll
er, termed optimizing adaptive quality controller (OAQC), can act both
as an optimizer-in case equipment models are not available-or as a co
ntroller for given models. The main components of the OAQC are shown a
nd a study of its performance is presented. The controller allows to s
pecify input and output constraints and weights, and input resolutions
. A multivariate control chart can he applied either as a deadband on
the controller or simply to provide out of control alarms. Experimenta
l designs can be utilized for on-line (recursive) model identification
in the optimization phase. For testing purposes, two chemical mechani
cal planarization processes were simulated based on real equipment mod
els. It is shown that the OAQC allows to keep adequate control even if
the input-output transfer function is severely nonlinear. Software im
plementation including the integration of the OAQC with the University
of Michigan's Generic Cell Controller (GCC) is briefly discussed.