Deep submicron technology makes interconnect one of the main factors d
etermining the circuit performance. Previous work shows that interconn
ect parameters exhibit a significant amount of spatial variation. In t
his work, we develop approaches to study the influence of the intercon
nect variation on circuit performance and to evaluate the circuit sens
itivity to interconnect parameters. First, an accurate interconnect mo
deling technique is presented, and an interconnect model library is de
veloped, Then, we explore an approach using parameterized interconnect
models to study circuit sensitivity via a ring oscillator circuit, Fi
nally, we present an alternative approach using statistical experiment
al design techniques to study the sensitivity of a large and complicat
ed circuit to interconnect variations.