V. Mohindra et al., ABATEMENT OF PERFLUOROCOMPOUNDS (PFCS) IN A MICROWAVE TUBULAR REACTORUSING O-2 AS AN ADDITIVE GAS, IEEE transactions on semiconductor manufacturing, 10(3), 1997, pp. 399-411
This paper discusses the abatement of four perfluorocompounds (PFC's)
in a microwave tubular reactor-C2F6, CF4, SF6, and CHF3. The abatement
was carried out using O-2 as an additive gas, and was studied as a fu
nction of O-2:PFC ratio, flowrate, power and pressure, Near 100% abate
ment was achieved for all the PFC's investigated, A detailed character
ization of C2F6 abatement using GC, GC/MS, and inline Mass Spectromete
r showed the major abatement products to be CO2, COF2, and F-2. The pa
rameteric dependence of CF4, SF6, and CHF3 abatement was also characte
rized experimentally, The major products from CF4 abatement were simil
ar to those from C2F6 abatement, Mass Spectroscopy indicated the main
products for SF6 abatement were SO2F2, SO2, and F-2 while those for CH
F3 were CO2, COF2, F-2, and HF. Additional experiments indicate that t
he microwave abatement unit can be successfully used to abate these PF
C's in the Integrated Circuit fabrication facilities.