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Results: 51-75/1048
Authors:
CARSTENSEN J
PRANGE R
POPKIROV GS
FOLL H
Citation: J. Carstensen et al., A MODEL FOR CURRENT OSCILLATIONS IN THE SI-HF SYSTEM BASED ON A QUANTITATIVE-ANALYSIS OF CURRENT TRANSIENTS, Applied physics A: Materials science & processing, 67(4), 1998, pp. 459-467
Authors:
IMRE A
GONTIERMOYA E
BEKE DL
EALET B
Citation: A. Imre et al., AUGER-ELECTRON SPECTROSCOPY OF THE KINETICS OF EVAPORATION OF PALLADIUM BEADED FILMS FROM SAPPHIRE SUBSTRATE, Applied physics A: Materials science & processing, 67(4), 1998, pp. 469-473
Authors:
SINGH K
BHOGA SS
Citation: K. Singh et Ss. Bhoga, THE ION CONDUCTION MECHANISM OF ISOVALENT CATION-DOPED LI2SO4, Applied physics A: Materials science & processing, 67(4), 1998, pp. 475-481
Authors:
ZHANG YZ
LIU J
GAO PJ
MA LP
SHI DX
PANG SJ
Citation: Yz. Zhang et al., STRUCTURE INVESTIGATION OF CELLOBIOHYDROLASE-I FROM TRICHODERMA-PSEUDOKONINGII S38 WITH A SCANNING TUNNELING MICROSCOPE, Applied physics A: Materials science & processing, 67(4), 1998, pp. 483-485
Authors:
VOROBYOVA AI
SOKOL VA
OUTKINA EA
Citation: Ai. Vorobyova et al., SEM INVESTIGATION OF PILLARED MICROSTRUCTURES FORMED BY ELECTROCHEMICAL ANODIZATION, Applied physics A: Materials science & processing, 67(4), 1998, pp. 487-492
Authors:
LIU JM
ONG CK
Citation: Jm. Liu et Ck. Ong, PULSED-LASER DEPOSITION OF ZNO AS CONDUCTIVE BUFFER LAYER OF (001)-LINBO3 THIN-FILMS, Applied physics A: Materials science & processing, 67(4), 1998, pp. 493-497
Authors:
ZHANG J
SUGIOKA K
MIDORIKAWA K
Citation: J. Zhang et al., HIGH-SPEED MACHINING OF GLASS MATERIALS BY LASER-INDUCED PLASMA-ASSISTED ABLATION USING A 532-NM LASER, Applied physics A: Materials science & processing, 67(4), 1998, pp. 499-501
Authors:
RESCH R
BUGACOV A
BAUR C
KOEL BE
MADHUKAR A
REQUICHA AAG
WILL P
Citation: R. Resch et al., MANIPULATION OF NANOPARTICLES USING DYNAMIC FORCE MICROSCOPY - SIMULATION AND EXPERIMENTS, Applied physics A: Materials science & processing, 67(3), 1998, pp. 265-271
Authors:
SPOSILI RS
IM JS
Citation: Rs. Sposili et Js. Im, LINE-SCAN SEQUENTIAL LATERAL SOLIDIFICATION OF SI THIN-FILMS, Applied physics A: Materials science & processing, 67(3), 1998, pp. 273-276
Authors:
FUCHIGAMI H
NAKAO Y
TANIMURA S
UEHARA Y
KURATA T
TSUNODA S
NIINO H
YABE A
Citation: H. Fuchigami et al., ORGANIC MOLECULAR-BEAM DEPOSITION COMBINED WITH A LASER-INDUCED CHEMICAL-REACTION, Applied physics A: Materials science & processing, 67(3), 1998, pp. 277-282
Authors:
TURCU R
BRIE M
LEISING G
TOSA V
MIHUT A
NIKO A
BOT A
Citation: R. Turcu et al., FTIR REFLECTANCE STUDIES OF ELECTROCHEMICALLY PREPARED POLYPYRROLE FILMS, Applied physics A: Materials science & processing, 67(3), 1998, pp. 283-287
Authors:
SERRA P
MORENZA JL
Citation: P. Serra et Jl. Morenza, ANALYSIS OF HYDROXYAPATITE LASER-ABLATION PLUMES IN A WATER ATMOSPHERE, Applied physics A: Materials science & processing, 67(3), 1998, pp. 289-294
Authors:
XIROUCHAKI C
MOSCHOVIS K
CHATZITHEODORIDIS E
KIRIAKIDIS G
MORGEN P
Citation: C. Xirouchaki et al., CHEMICAL CHARACTERIZATION OF AS-DEPOSITED MICROCRYSTALLINE INDIUM OXIDE-FILMS PREPARED BY REACTIVE DC MAGNETRON SPUTTERING, Applied physics A: Materials science & processing, 67(3), 1998, pp. 295-301
Authors:
SHAFEEV GA
Citation: Ga. Shafeev, LASER-ASSISTED ACTIVATION OF DIELECTRICS FOR ELECTROLESS METAL PLATING, Applied physics A: Materials science & processing, 67(3), 1998, pp. 303-311
Authors:
XIONG SB
YE ZM
CHEN XY
GUO XL
ZHU SN
LIU ZG
LIN CY
JIN YS
Citation: Sb. Xiong et al., FERROELECTRIC SRXBA1-XNB2O6 OPTICAL WAVE-GUIDING THIN-FILMS ON SIO2-COATED SI(100) SUBSTRATES, Applied physics A: Materials science & processing, 67(3), 1998, pp. 313-316
Authors:
SCEPANOVIC M
JEVTIC M
Citation: M. Scepanovic et M. Jevtic, RESONANT RAMAN STUDIES OF SURFACE-COMPOSITION AND STRUCTURAL ORDERINGIN LASER-IRRADIATED HG1-XCDXTE, Applied physics A: Materials science & processing, 67(3), 1998, pp. 317-322
Authors:
MAXWELL JL
PEGNA J
MESSIA DV
Citation: Jl. Maxwell et al., REAL-TIME VOLUMETRIC GROWTH-RATE MEASUREMENTS AND FEEDBACK-CONTROL OF3-DIMENSIONAL LASER-CHEMICAL VAPOR-DEPOSITION, Applied physics A: Materials science & processing, 67(3), 1998, pp. 323-329
Authors:
CHEN XY
WU ZC
LIU ZG
LEI XY
SHA ZS
Citation: Xy. Chen et al., A STUDY OF DYNAMICS AND CHEMICAL-REACTIONS IN LASER-ABLATED PBTIO3 PLUME BY OPTICAL-WAVELENGTH-SENSITIVE CCD PHOTOGRAPHY, Applied physics A: Materials science & processing, 67(3), 1998, pp. 331-334
Authors:
MCILROY DN
HWANG SD
YANG K
REMMES N
DOWBEN PA
AHMAD AA
IANNO NJ
LI JZ
LIN JY
JIANG HX
Citation: Dn. Mcilroy et al., THE INCORPORATION OF NICKEL AND PHOSPHORUS DOPANTS INTO BORON-CARBON ALLOY THIN-FILMS, Applied physics A: Materials science & processing, 67(3), 1998, pp. 335-342
Authors:
NOH DY
KANG HC
SEONG TY
JE JH
KIM HK
Citation: Dy. Noh et al., TETRAGONAL DISTORTION AND THE DOMAIN-STRUCTURE OF THIN PB (ZR,TI)O-3 MGO(100) FILMS/, Applied physics A: Materials science & processing, 67(3), 1998, pp. 343-346
PHOTOABLATION AND MICROSTRUCTURING OF POLYESTERCARBONATES AND THEIR BLENDS WITH A XECL EXCIMER-LASER
Authors:
KUNZ T
STEBANI J
IHLEMANN J
WOKAUN A
Citation: T. Kunz et al., PHOTOABLATION AND MICROSTRUCTURING OF POLYESTERCARBONATES AND THEIR BLENDS WITH A XECL EXCIMER-LASER, Applied physics A: Materials science & processing, 67(3), 1998, pp. 347-352
Authors:
GAO RW
ZHANG DH
LI H
ZHANG JC
Citation: Rw. Gao et al., EFFECTS OF THE DEGREE OF GRAIN ALIGNMENT ON THE HARD MAGNETIC-PROPERTIES OF SINTERED NDFEB MAGNETS, Applied physics A: Materials science & processing, 67(3), 1998, pp. 353-356
Authors:
HAMOUDI A
SOGAWA T
SAITOH T
YUMOTO J
Citation: A. Hamoudi et al., REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION REAL-TIME MONITORING OF AN ETCH PROCESS IMPLEMENTED IN MOLECULAR-BEAM EPITAXY TECHNOLOGY - HYDROGEN-CHLORIDE VERSUS GAAS(001) EPILAYERS, Applied physics A: Materials science & processing, 67(3), 1998, pp. 357-359
Authors:
LIANG JH
Citation: Jh. Liang, ANALYSIS OF DEPTH PROFILES OF IMPLANTED LEAD IONS IN SILICON, Applied physics A: Materials science & processing, 67(3), 1998, pp. 361-365
Authors:
HOU QR
GAO J
LI SJ
Citation: Qr. Hou et al., ADHERENT SIC COATINGS ON NI-CR ALLOYS WITH A COMPOSITION-GRADED INTERMEDIATE LAYER, Applied physics A: Materials science & processing, 67(3), 1998, pp. 367-370