ACNP - Italian Periodicals Catalogue

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Results: 1-21 |

Results: 21

CHARACTERIZATION OF ELECTRICALLY ACTIVE DEEP-LEVEL DEFECTS IN 4H AND 6H SIC

Authors: DOYLE JP ABOELFOTOH MO SVENSSON BG SCHONER A NORDELL N

Citation: Jp. Doyle et al., CHARACTERIZATION OF ELECTRICALLY ACTIVE DEEP-LEVEL DEFECTS IN 4H AND 6H SIC, DIAMOND AND RELATED MATERIALS, 6(10), 1997, pp. 1388-1391

ELECTRICAL AND MICROSTRUCTURAL CHARACTERISTICS OF GE CU OHMIC CONTACTS TO N-TYPE GAAS/

Authors: ABOELFOTOH MO OKTYABRSKY S NARAYAN J WOODALL JM

Citation: Mo. Aboelfotoh et al., ELECTRICAL AND MICROSTRUCTURAL CHARACTERISTICS OF GE CU OHMIC CONTACTS TO N-TYPE GAAS/, Journal of materials research, 12(9), 1997, pp. 2325-2331

FOREWORD

Authors: NARAYAN J ABOELFOTOH MO SANCHEZ J

Citation: J. Narayan et al., FOREWORD, Journal of electronic materials, 25(11), 1996, pp. 1661-1661

CU3GE OHMIC CONTACTS TO N-TYPE GAAS

Authors: OKTYABRSKY S ABOELFOTOH MO NARAYAN J WOODALL JM

Citation: S. Oktyabrsky et al., CU3GE OHMIC CONTACTS TO N-TYPE GAAS, Journal of electronic materials, 25(11), 1996, pp. 1662-1672

MICROSTRUCTURE AND CHEMISTRY OF CU-GE OHMIC CONTACT LAYERS TO GAAS

Authors: OKTYABRSKY S ABOELFOTOH MO NARAYAN J

Citation: S. Oktyabrsky et al., MICROSTRUCTURE AND CHEMISTRY OF CU-GE OHMIC CONTACT LAYERS TO GAAS, Journal of electronic materials, 25(11), 1996, pp. 1673-1683

COPPER GERMANIDE SCHOTTKY-BARRIER CONTACTS TO SILICON

Authors: DOYLE JP SVENSSON BG ABOELFOTOH MO

Citation: Jp. Doyle et al., COPPER GERMANIDE SCHOTTKY-BARRIER CONTACTS TO SILICON, Journal of applied physics, 80(4), 1996, pp. 2530-2532

OPTICAL-RESPONSE OF CU3GE THIN-FILMS

Authors: GUIZZETTI G MARABELLI F PELLEGRINO P SASSELLA A ABOELFOTOH MO

Citation: G. Guizzetti et al., OPTICAL-RESPONSE OF CU3GE THIN-FILMS, Journal of applied physics, 79(10), 1996, pp. 8115-8117

LOW-RESISTIVITY COPPER GERMANIDE ON (100)SI FOR CONTACTS AND INTERCONNECTIONS

Authors: BOREK MA OKTYABRSKY S ABOELFOTOH MO NARAYAN J

Citation: Ma. Borek et al., LOW-RESISTIVITY COPPER GERMANIDE ON (100)SI FOR CONTACTS AND INTERCONNECTIONS, Applied physics letters, 69(23), 1996, pp. 3560-3562

ELECTRICAL CHARACTERISTICS OF METAL ALN/N-TYPE 6H-SIC(0001) HETEROSTRUCTURES/

Authors: ABOELFOTOH MO KERN RS TANAKA S DAVIS RF HARRIS CI

Citation: Mo. Aboelfotoh et al., ELECTRICAL CHARACTERISTICS OF METAL ALN/N-TYPE 6H-SIC(0001) HETEROSTRUCTURES/, Applied physics letters, 69(19), 1996, pp. 2873-2875

INTERACTION BETWEEN COPPER AND POINT-DEFECTS IN SILICON IRRADIATED WITH 2-MEV ELECTRONS

Authors: ABOELFOTOH MO SVENSSON BG

Citation: Mo. Aboelfotoh et Bg. Svensson, INTERACTION BETWEEN COPPER AND POINT-DEFECTS IN SILICON IRRADIATED WITH 2-MEV ELECTRONS, Physical review. B, Condensed matter, 52(4), 1995, pp. 2522-2527

EFFECT OF PHASE-TRANSITIONS IN COPPER-GERMANIUM THIN-FILM ALLOYS ON THEIR ELECTRICAL-RESISTIVITY

Authors: TAWANCY HM ABOELFOTOH MO

Citation: Hm. Tawancy et Mo. Aboelfotoh, EFFECT OF PHASE-TRANSITIONS IN COPPER-GERMANIUM THIN-FILM ALLOYS ON THEIR ELECTRICAL-RESISTIVITY, Journal of Materials Science, 30(23), 1995, pp. 6053-6064

AN INVESTIGATION OF THE STABILITY OF COPPER GERMANIDE THIN-FILMS IN THE PRESENCE OF SI AND SIO2

Authors: DOYLE JP SVENSSON BG ABOELFOTOH MO HUDNER J

Citation: Jp. Doyle et al., AN INVESTIGATION OF THE STABILITY OF COPPER GERMANIDE THIN-FILMS IN THE PRESENCE OF SI AND SIO2, Physica scripta. T, 54, 1994, pp. 297-299

EFFECT OF INTERFACIAL HYDROGEN IN COSI2 SI(100) SCHOTTKY-BARRIER CONTACTS/

Authors: ABOELFOTOH MO MARWICK AD FREEOUF JL

Citation: Mo. Aboelfotoh et al., EFFECT OF INTERFACIAL HYDROGEN IN COSI2 SI(100) SCHOTTKY-BARRIER CONTACTS/, Physical review. B, Condensed matter, 49(15), 1994, pp. 10753-10756

MICROSTRUCTURE CHARACTERIZATION OF CU3GE N-TYPE GAAS OHMIC CONTACTS

Authors: ABOELFOTOH MO OKTYABRSKY S NARAYAN J WOODALL JM

Citation: Mo. Aboelfotoh et al., MICROSTRUCTURE CHARACTERIZATION OF CU3GE N-TYPE GAAS OHMIC CONTACTS, Journal of applied physics, 76(10), 1994, pp. 5760-5763

EFFECT OF CRYSTAL-STRUCTURE ON THE ELECTRICAL-RESISTIVITY OF COPPER-GERMANIUM THIN-FILM ALLOYS

Authors: ABOELFOTOH MO TAWANCY HM

Citation: Mo. Aboelfotoh et Hm. Tawancy, EFFECT OF CRYSTAL-STRUCTURE ON THE ELECTRICAL-RESISTIVITY OF COPPER-GERMANIUM THIN-FILM ALLOYS, Journal of applied physics, 75(5), 1994, pp. 2441-2446

ELECTRICAL-TRANSPORT PROPERTIES OF CU3GE THIN-FILMS

Authors: ABOELFOTOH MO TU KN NAVA F MICHELINI M

Citation: Mo. Aboelfotoh et al., ELECTRICAL-TRANSPORT PROPERTIES OF CU3GE THIN-FILMS, Journal of applied physics, 75(3), 1994, pp. 1616-1619

NOVEL LOW-RESISTANCE OHMIC CONTACT TO N-TYPE GAAS USING CU3GE

Authors: ABOELFOTOH MO LIN CL WOODALL JM

Citation: Mo. Aboelfotoh et al., NOVEL LOW-RESISTANCE OHMIC CONTACT TO N-TYPE GAAS USING CU3GE, Applied physics letters, 65(25), 1994, pp. 3245-3247

FREQUENCY-DEPENDENCE OF DIELECTRIC LOSS IN THIN AROMATIC POLYIMIDE FILMS

Authors: ABOELFOTOH MO FEGER C

Citation: Mo. Aboelfotoh et C. Feger, FREQUENCY-DEPENDENCE OF DIELECTRIC LOSS IN THIN AROMATIC POLYIMIDE FILMS, Physical review. B, Condensed matter, 47(20), 1993, pp. 13395-13400

CORRELATION OF ELECTRICAL-RESISTIVITY ANOMALIES AND CRYSTAL-STRUCTUREIN COPPER-GERMANIUM THIN-FILM ALLOYS

Authors: ABOELFOTOH MO TAWANCY HM KRUSINELBAUM L

Citation: Mo. Aboelfotoh et al., CORRELATION OF ELECTRICAL-RESISTIVITY ANOMALIES AND CRYSTAL-STRUCTUREIN COPPER-GERMANIUM THIN-FILM ALLOYS, Applied physics letters, 63(12), 1993, pp. 1622-1624

DIELECTRIC LOSS IN THIN-FILMS OF AN AROMATIC POLYIMIDE

Authors: ABOELFOTOH MO FEGER C CASTELLANO A KAUFMAN R MOLIS S

Citation: Mo. Aboelfotoh et al., DIELECTRIC LOSS IN THIN-FILMS OF AN AROMATIC POLYIMIDE, Applied physics letters, 62(18), 1993, pp. 2286-2288

ELECTRICAL-PROPERTIES OF COPPER SILICON SCHOTTKY BARRIERS

Authors: ABOELFOTOH MO SVENSSON BG

Citation: Mo. Aboelfotoh et Bg. Svensson, ELECTRICAL-PROPERTIES OF COPPER SILICON SCHOTTKY BARRIERS, Semiconductor science and technology, 6(7), 1991, pp. 647-652

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