Authors:
ALEXE M
SCOTT JF
PIGNOLET A
HESSE D
GOSELE U
Citation: M. Alexe et al., PB(ZR,TI)O-3-SILICON HETEROSTRUCTURES FABRICATED BY DIRECT WAFER BONDING, Integrated ferroelectrics, 19(1-4), 1998, pp. 95-109
Authors:
YANG PX
ZHENG LR
LIN CL
PIGNOLET A
CURRAN C
ALEXE M
HESSE D
Citation: Px. Yang et al., PULSED-LASER DEPOSITION AND CHARACTERISTICS OF SRBI2TANBO9 THIN-FILMS, Journal of the Korean Physical Society, 32, 1998, pp. 1383-1385
Authors:
ALEXE M
PIGNOLET A
SENZ S
HESSE D
GOSELE U
Citation: M. Alexe et al., DIRECT WAFER BONDING - A NEW METHOD FOR FERROELECTRIC-SILICON HETEROSTRUCTURE FABRICATION, Journal of the Korean Physical Society, 32, 1998, pp. 1618-1621
Citation: M. Alexe et al., DEPOSITION AND PROCESSING OF BISMUTH TITANATE THIN-FILMS FOR DIRECT WAFER BONDING, Materials chemistry and physics, 55(1), 1998, pp. 55-60
Authors:
ALEXE M
SCOTT JF
CURRAN C
ZAKHAROV ND
HESSE D
PIGNOLET A
Citation: M. Alexe et al., SELF-PATTERNING NANO-ELECTRODES ON FERROELECTRIC THIN-FILMS FOR GIGABIT MEMORY APPLICATIONS, Applied physics letters, 73(11), 1998, pp. 1592-1594
Citation: M. Alexe, MEASUREMENT OF INTERFACE-TRAP STATES IN METAL-FERROELECTRIC-SILICON HETEROSTRUCTURES, Applied physics letters, 72(18), 1998, pp. 2283-2285
Authors:
PIGNOLET A
WELKE S
CURRAN C
ALEXE M
SENZ S
HESSE D
Citation: A. Pignolet et al., LARGE-AREA PULSED-LASER DEPOSITION OF AURIVILLIUS-TYPE LAYERED PEROVSKITE THIN-FILMS, Ferroelectrics, 202(1-4), 1997, pp. 285-298
Citation: M. Alexe et al., PHYSICAL-PROPERTIES OF SPIN-ON SOLUTION DEPOSITED BI4TI3O12 THIN-FILMS ON SI SUBSTRATES, Ferroelectrics, 201(1-4), 1997, pp. 157-165
Citation: M. Alexe et al., FERROELECTRIC-SEMICONDUCTOR HETEROSTRUCTURES OBTAINED BY DIRECT WAFERBONDING, Applied physics letters, 70(25), 1997, pp. 3416-3418
Authors:
BIRJEGA MI
POPA S
SANDU V
ALEXE M
SARBU C
Citation: Mi. Birjega et al., THE ELECTRICAL-RESISTANCE VERSUS TEMPERATURE-DEPENDENCE OF SINGLE AMORPHOUS CRNI (40 60) THIN-FILMS RF-SPUTTERED IN HIGH ARGON PRESSURE/, Journal of materials science letters, 15(1), 1996, pp. 77-79
Citation: Mi. Birjega et M. Alexe, THE INFLUENCE OF THE ARGON PRESSURE AND SUBSTRATE-TEMPERATURE ON THE STRUCTURE OF RF-SPUTTERED CRNI(65-35), CRNI(50-50) AND CRNI(20-8O) THIN-FILMS, Thin solid films, 275(1-2), 1996, pp. 152-154
Citation: M. Alexe et L. Pintilie, THERMAL-ANALYSIS OF THE PYROELECTRIC BIMORPH AS RADIATION DETECTOR, Infrared physics & technology, 36(6), 1995, pp. 949-954