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ALFORD TL
PIZZICONI VB
LAURSEN T
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Authors:
ZENG YX
ALFORD TL
ZOU YL
AMALI A
ULLRICH BM
DENG F
LAU SS
Citation: Yx. Zeng et al., TEXTURE AND MICROSTRUCTURAL EVOLUTION OF THIN SILVER FILMS IN AG TI BILAYERS/, Journal of applied physics, 83(2), 1998, pp. 779-785
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ZOU YL
ALFORD TL
ZENG YX
DENG F
LAU SS
LAURSEN T
AMALI AI
ULLRICH BM
Citation: Yl. Zou et al., FORMATION OF TITANIUM NITRIDE BY ANNEALING AG TI STRUCTURES IN AMMONIA AMBIENT/, Journal of applied physics, 82(7), 1997, pp. 3321-3327
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ZENG YX
ZOU YL
ALFORD TL
DENG F
LAU SS
LAURSEN T
ULLRICH BM
Citation: Yx. Zeng et al., TEXTURE AND STRESS OF AG FILMS IN AG TI, AG/CR BILAYERS, AND SELF-ENCAPSULATED STRUCTURES/, Journal of applied physics, 81(12), 1997, pp. 7773-7777
Authors:
ALFORD TL
ADAMS D
THEODORE ND
LAURSEN T
KIM MJ
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BAIR AE
ALFORD TL
SEGO S
ATZMON Z
CULBERTSON RJ
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ADAMS D
ALFORD TL
RAFALSKI SA
RACK MJ
RUSSELL SW
KIM MJ
MAYER JW
Citation: D. Adams et al., FORMATION OF PASSIVATION AND ADHESION LAYERS FOR CU VIA NITRIDATION OF CU-TI IN AN AMMONIA AMBIENT, Materials chemistry and physics, 43(2), 1996, pp. 145-152
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ATZMON Z
RUSSELL SW
BARBOUR JC
ALFORD TL
MAYER JW
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MENENDEZ J
WINDL W
SANKEY OF
SPENCER GS
SEGO S
CULBERTSON RB
BAIR AE
ALFORD TL
Citation: M. Melendezlira et al., CARBON DEPENDENCE OF RAMAN MODE FREQUENCIES IN SI1-X-YGEXCY ALLOYS, Physical review. B, Condensed matter, 54(18), 1996, pp. 12866-12872
Authors:
BARBERO CJ
DENG C
SIGMON TW
RUSSELL SW
ALFORD TL
Citation: Cj. Barbero et al., THE FABRICATION OF NICKEL AND CHROMIUM SILICIDE USING AN XECL EXCIMER-LASER, Journal of crystal growth, 165(1-2), 1996, pp. 57-60
Authors:
RUSSELL SW
ALFORD TL
LUPTAK KA
PIZZICONI VB
MAYER JW
Citation: Sw. Russell et al., THE APPLICATION OF ION-BEAM ANALYSIS TO CALCIUM PHOSPHATE-BASED BIOMATERIALS, Journal of biomedical materials research, 30(2), 1996, pp. 165-174
Authors:
RAMANATH G
XIAO HZ
LAI SL
ALLEN LH
ALFORD TL
Citation: G. Ramanath et al., AU-MEDIATED LOW-TEMPERATURE SOLID-PHASE EPITAXIAL-GROWTH OF A SIXGE1-X ALLOY ON SI(001), Journal of applied physics, 79(6), 1996, pp. 3094-3102
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ALFORD TL
JAQUEZ EJ
THEODORE ND
RUSSELL SW
DIALE M
ADAMS D
ANDERS S
Citation: Tl. Alford et al., INFLUENCE OF INTERFACIAL COPPER ON THE ROOM-TEMPERATURE OXIDATION OF SILICON, Journal of applied physics, 79(4), 1996, pp. 2074-2078
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