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Results:
1-12
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Results: 12
Authors:
Sarantopoulou, E
Cefalas, AC
Argitis, P
Gogolides, E
Citation: E. Sarantopoulou et al., Photoresist materials for 157-nm photolithography, MAT SCI E C, 15(1-2), 2001, pp. 159-161
Authors:
Mladenov, G
Vutova, K
Raptis, I
Argitis, P
Rangelow, I
Citation: G. Mladenov et al., Simulation of latent image formation for ion beam projection lithography, MICROEL ENG, 57-8, 2001, pp. 335-342
Authors:
Diakoumakos, CD
Raptis, I
Tserepi, A
Argitis, P
Citation: Cd. Diakoumakos et al., Negative (meth)acrylate resist materials based on novel crosslinking chemistry, MICROEL ENG, 57-8, 2001, pp. 539-545
Authors:
Raptis, I
Glezos, N
Valamontes, E
Zervas, E
Argitis, P
Citation: I. Raptis et al., Electron beam lithography simulation for high resolution and high-density patterns, VACUUM, 62(2-3), 2001, pp. 263-271
Authors:
Glezos, N
Argitis, P
Velessiotis, D
Raptis, I
Hatzakis, M
Hudek, P
Kostic, I
Citation: N. Glezos et al., Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography, J VAC SCI B, 18(6), 2000, pp. 3431-3434
Authors:
Cefalas, AC
Sarantopoulou, E
Gogolides, E
Argitis, P
Citation: Ac. Cefalas et al., Absorbance and outgasing of photoresist polymeric materials for UV lithography below 193 nm including 157 nm lithography, MICROEL ENG, 53(1-4), 2000, pp. 123-126
Authors:
Argitis, P
Glezos, N
Vasilopoulou, M
Raptis, I
Hatzakis, M
Everett, J
Meneghini, G
Palumbo, A
Ardito, M
Hudek, P
Kostic, I
Citation: P. Argitis et al., Aqueous base developable epoxy resist for high sensitivity electron beam lithography, MICROEL ENG, 53(1-4), 2000, pp. 453-456
Authors:
Raptis, I
Velessiotis, D
Vasilopoulou, M
Argitis, P
Citation: I. Raptis et al., Development mechanism study by dissolution monitoring of positive methacrylate photoresists, MICROEL ENG, 53(1-4), 2000, pp. 489-492
Authors:
Cefalas, AC
Sarantopoulou, E
Argitis, P
Gogolides, E
Citation: Ac. Cefalas et al., Mass spectroscopic and degassing characteristics of polymeric materials for 157 nm photolithography, APPL PHYS A, 69, 1999, pp. S929-S933
Authors:
Ioakimoglou, E
Boyatzis, S
Argitis, P
Fostiridou, A
Papapanagiotou, K
Yannovits, N
Citation: E. Ioakimoglou et al., Thin-film study on the oxidation of linseed oil in the presence of selected copper pigments, CHEM MATER, 11(8), 1999, pp. 2013-2022
Authors:
Seo, Y
Lee, K
Yi, M
Seo, E
Choi, BK
Kim, O
Raptis, I
Argitis, P
Hatzakis, M
Citation: Y. Seo et al., Evaluation of advanced epoxy novolac resist, EPR, for sub 100nm synchrotron x-ray proximity lithography, MICROEL ENG, 46(1-4), 1999, pp. 461-464
Authors:
Tegou, E
Gogolides, E
Argitis, P
Raptis, I
Meneghini, G
Cui, Z
Citation: E. Tegou et al., Silylation and dry development of chemically amplified resists SAL601(1),AZPN114*(1), and epoxidised resist (EPR*(1)) for high resolution electron-beam lithography, JPN J A P 1, 37(12B), 1998, pp. 6873-6876
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