Authors: ROTH KD BLASINGBANGERT C

Citation: Kd. Roth et C. Blasingbangert, ACTUAL PERFORMANCE DATA ON THE NEW PATTERN PLACEMENT METROLOGY TOOL LEITZ LMS-2020, Microelectronic engineering, 23(1-4), 1994, pp. 403-406

Authors: TRUBE J HUBER HL BLASINGBANGERT C RINN K ROTH KD

Citation: J. Trube et al., HIGH-PERFORMANCE PATTERN PLACEMENT METROLOGY ON DYNAMIC RANDOM-ACCESSMEMORY LAYERS OF 0.25 MU-M TECHNOLOGY, JPN J A P 1, 32(12B), 1993, pp. 6274-6276

Authors: NASH SC BLASINGBANGERT C ROTH KD

Citation: Sc. Nash et al., PATTERN PLACEMENT METROLOGY ON X-RAY MASKS, Microelectronic engineering, 21(1-4), 1993, pp. 83-86

Authors: RANGELOW IW LAHR V KASSING R BLASINGBANGERT C ROTH KD BOSCH G CHALUPKA A FISCHER R LOSCHNER H NOWAK R TRAHER C STENGL G KRAUS H BAYER E

Citation: Iw. Rangelow et al., DISTORTION EVALUATION OF NICKEL STENCIL MASKS WITH THE HELP OF ION PROXIMITY EXPOSURES AND REGISTRATION MEASUREMENTS ON THE LEITZ LMS-2000, Microelectronic engineering, 21(1-4), 1993, pp. 359-362