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Results: 1-11 |
Results: 11

Authors: Liu, X Babcock, JR Lane, MA Belot, JA Ott, AW Metz, M Kannewurf, CR Chang, RPH Marks, TJ
Citation: X. Liu et al., Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors, CHEM VAPOR, 7(1), 2001, pp. 25

Authors: Schuetz, SA Day, VW Sommer, RD Rheingold, AL Belot, JA
Citation: Sa. Schuetz et al., Anhydrous lanthanide Schiff base complexes and their preparation using lanthanide triflate derived amides, INORG CHEM, 40(20), 2001, pp. 5292

Authors: Yan, M Koide, Y Babcock, JR Markworth, PR Belot, JA Marks, TJ Chang, RPH
Citation: M. Yan et al., Selective-area atomic layer epitaxy growth of ZnO features on soft lithography-patterned substrates, APPL PHYS L, 79(11), 2001, pp. 1709-1711

Authors: Teren, AR Belot, JA Edleman, NL Marks, TJ Wessels, BW
Citation: Ar. Teren et al., MOCVD of epitaxial BaTiO3 films using a liquid barium precursor, CHEM VAPOR, 6(4), 2000, pp. 175-177

Authors: Babcock, JR Benson, DD Wang, AC Edleman, NL Belot, JA Metz, MV Marks, TJ
Citation: Jr. Babcock et al., Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor, CHEM VAPOR, 6(4), 2000, pp. 180-183

Authors: McNeely, RJ Belot, JA Marks, TJ Wang, YG Dravid, VP Chudzik, MP Kannewurf, CR
Citation: Rj. Mcneely et al., Analysis of the fluoride effect on the phase-selective growth of TlBa2Ca2Cu3O9-x thin films: Phase evolution and microstructure development, J MATER RES, 15(5), 2000, pp. 1083-1097

Authors: Belot, JA Wang, AC McNeely, RJ Liable-Sands, L Rheingold, AL Marks, TJ
Citation: Ja. Belot et al., Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films, CHEM VAPOR, 5(2), 1999, pp. 65

Authors: Wang, AC Belot, JA Marks, TJ Markworth, PR Chang, RPH Chudzik, MP Kannewurf, CR
Citation: Ac. Wang et al., Buffers for high temperature superconductor coatings. Low temperature growth of CeO2 films by metal-organic chemical vapor deposition and their implementation as buffers, PHYSICA C, 320(3-4), 1999, pp. 154-160

Authors: Wang, AC Belot, JA Marks, TJ
Citation: Ac. Wang et al., Film microstructure-deposition condition relationships in the growth of epitaxial NiO films by metalorganic chemical vapor deposition on oxide and metal substrates, J MATER RES, 14(3), 1999, pp. 1132-1136

Authors: Belot, JA McNeely, RJ Wang, AC Reedy, CJ Marks, TJ Yap, GPA Rheingold, AL
Citation: Ja. Belot et al., Expedient route to volatile zirconium metal-organic chemical vapor deposition precursors using amide synthons and implementation in yttria-stabilizedzirconia film growth, J MATER RES, 14(1), 1999, pp. 12-15

Authors: McCullough, RD Petruska, MA Belot, JA
Citation: Rd. Mccullough et al., Investigating the synthesis of unsymmetrical tetrathiafulvalene derivatives: Improved yields by the hidden equivalent method., TETRAHEDRON, 55(33), 1999, pp. 9979-9998
Risultati: 1-11 |