Authors: Hebner, GA Blain, MG Hamilton, TW Nichols, CA Jarecki, RL

Citation: Ga. Hebner et al., Surface dependent electron and negative ion density in inductively coupleddischarges, J VAC SCI A, 17(6), 1999, pp. 3172-3178

Authors: Woodworth, JR Blain, MG Jarecki, RL Hamilton, TW Aragon, BP

Citation: Jr. Woodworth et al., Absolute intensities of the vacuum ultraviolet spectra in a metal-etch plasma processing discharge, J VAC SCI A, 17(6), 1999, pp. 3209-3217

Authors: Hebner, GA Blain, MG Hamilton, TW

Citation: Ga. Hebner et al., Influence of surface material on the boron chloride density in inductivelycoupled discharges, J VAC SCI A, 17(6), 1999, pp. 3218-3224

Authors: Blain, MG

Citation: Mg. Blain, Mechanism of nitrogen removal from silicon nitride by nitric oxide, J VAC SCI A, 17(2), 1999, pp. 665-667

Authors: Blain, MG Jarecki, RL Simonson, RJ

Citation: Mg. Blain et al., Chemical downstream etching of tungsten (vol A16, pg 2115, 1998), J VAC SCI A, 17(1), 1999, pp. 323-323

Authors: Blain, MG Stevens, JE Woodworth, JR

Citation: Mg. Blain et al., High-resolution submicron retarding field energy analyzer for low-temperature plasma analysis, APPL PHYS L, 75(25), 1999, pp. 3923-3925