Authors:
Kessels, WMM
Boogaarts, MGH
Hoefnagels, JPM
Schram, DC
van de Sanden, MCM
Citation: Wmm. Kessels et al., Improvement of hydrogenated amorphous silicon properties with increasing contribution of SiH3 to film growth, J VAC SCI A, 19(3), 2001, pp. 1027-1029
Authors:
Kessels, WMM
Leroux, A
Boogaarts, MGH
Hoefnagels, JPM
van de Sanden, MCM
Schram, DC
Citation: Wmm. Kessels et al., Cavity ring down detection of SiH3 in a remote SiH4 plasma and comparison with model calculations and mass spectrometry, J VAC SCI A, 19(2), 2001, pp. 467-476
Authors:
Kessels, WMM
Hoefnagels, JPM
Boogaarts, MGH
Schram, DC
van de Sanden, MCM
Citation: Wmm. Kessels et al., Cavity ring down study of the densities and kinetics of Si and SiH in a remote Ar-H-2-SiH4 plasma, J APPL PHYS, 89(4), 2001, pp. 2065-2073
Authors:
van der Heijden, HWP
Boogaarts, MGH
Mazouffre, S
van der Mullen, JAM
Schram, DC
Citation: Hwp. Van Der Heijden et al., Time-resolved experimental and computational study of two-photon laser-induced fluorescence in a hydrogen plasma, PHYS REV E, 61(4), 2000, pp. 4402-4409
Authors:
Boogaarts, MGH
Bocker, PJ
Kessels, WMM
Schram, DC
van de Sanden, MCM
Citation: Mgh. Boogaarts et al., Cavity ring down detection of SiH3 on the broadband (A)over-tilde (2)A '(1) <- (X)over-tilde (2)A(1) transition in a remote Ar-H-2-SiH4 plasma, CHEM P LETT, 326(5-6), 2000, pp. 400-406
Authors:
van de Sanden, MCM
van Hest, MFAM
de Graaf, A
Smets, AHM
Letourneur, KGY
Boogaarts, MGH
Schram, DC
Citation: Mcm. Van De Sanden et al., Plasma chemistry of an expanding Ar/C2H2 plasma used for fast deposition of a-C : H, DIAM RELAT, 8(2-5), 1999, pp. 677-681
Authors:
Engeln, R
Letourneur, KGY
Boogaarts, MGH
van de Sanden, MCM
Schram, DC
Citation: R. Engeln et al., Detection of CH in an expanding argon/acetylene plasma using cavity ring down absorption spectroscopy, CHEM P LETT, 310(5-6), 1999, pp. 405-410