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Results:
1-8
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Results: 8
Authors:
Brissonneau, L
Vahlas, C
Citation: L. Brissonneau et C. Vahlas, Precursors and operating conditions for the metal-organic chemical vapor deposition of nickel films, ANN CHIM-SC, 25(2), 2000, pp. 81-90
Authors:
Brissonneau, L
Sahnoun, R
Mijoule, C
Vahlas, C
Citation: L. Brissonneau et al., Investigation of nickelocene decomposition during chemical vapor deposition of nickel, J ELCHEM SO, 147(4), 2000, pp. 1443-1448
Authors:
Brissonneau, L
Kacheva, A
Senocq, F
Kang, JK
Rhee, SW
Gleizes, A
Vahlas, C
Citation: L. Brissonneau et al., MOCVD of Ni and Ni3C films from Ni(dmen)(2)(tfa)(2), J PHYS IV, 9(P8), 1999, pp. 597-604
Authors:
de Caro, D
Brissonneau, L
Boursier, D
Madar, R
Vahlas, C
Citation: D. De Caro et al., Composition and magnetic properties of MOCVD processed thin films from nickelocene, J PHYS IV, 9(P8), 1999, pp. 1099-1106
Authors:
Brissonneau, L
Reynes, A
Vahlas, C
Citation: L. Brissonneau et al., Growth mechanisms of MOCVD processed Ni thin films, J PHYS IV, 9(P8), 1999, pp. 57-64
Authors:
Brissonneau, L
Reynes, A
Vahlas, C
Citation: L. Brissonneau et al., MOCVD processed ni films from nickelocene. Part III: Gas phase study and deposition mechanisms, CHEM VAPOR, 5(6), 1999, pp. 281-290
Authors:
Brissonneau, L
Vahlas, C
Citation: L. Brissonneau et C. Vahlas, MOCVD-processed Ni films from nickelocene. Part I: Growth rate and morphology, CHEM VAPOR, 5(4), 1999, pp. 135-142
Authors:
Brissonneau, L
de Caro, D
Boursier, D
Madar, R
Vahlas, C
Citation: L. Brissonneau et al., MOCVD-processed Ni films from nickelocene. Part II: Carbon content of the deposits, CHEM VAPOR, 5(4), 1999, pp. 143-149
Risultati:
1-8
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