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Authors:
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Citation: Mh. Somervell et al., Study of the fundamental contributions to line edge roughness in a 193 nm,top surface imaging system, J VAC SCI B, 18(5), 2000, pp. 2551-2559
Authors:
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Citation: Sv. Postnikov et al., Study of resolution limits due to intrinsic bias in chemically amplified photoresists, J VAC SCI B, 17(6), 1999, pp. 3335-3338
Authors:
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Citation: Rj. Soulen et al., Conduction across the interface between a superconductor and a spin polarized metal, IEEE APPL S, 9(2), 1999, pp. 3636-3639
Authors:
Smart, MC
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Citation: Mc. Smart et al., Performance characteristics of lithium-ion cells for NASA's Mars 2001 Lander application, IEEE AES M, 14(11), 1999, pp. 36-42
Authors:
Soulen, RJ
Osofsky, MS
Nadgorny, B
Ambrose, T
Broussard, P
Cheng, SF
Byers, J
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Nowack, J
Moodera, JS
Laprade, G
Barry, A
Coey, MD
Citation: Rj. Soulen et al., Andreev reflection: A new means to determine the spin polarization of ferromagnetic materials, J APPL PHYS, 85(8), 1999, pp. 4589-4591