Authors:
KLEINSORGE B
ILIE A
CHHOWALLA M
FUKAREK W
MILNE WI
ROBERTSON J
Citation: B. Kleinsorge et al., ELECTRICAL AND OPTICAL-PROPERTIES OF BORONATED TETRAHEDRALLY BONDED AMORPHOUS-CARBON (TA-C-B), DIAMOND AND RELATED MATERIALS, 7(2-5), 1998, pp. 472-476
Authors:
MUNINDRADASA DAI
CHHOWALLA M
AMARATUNGA GAJ
SILVA SRP
Citation: Dai. Munindradasa et al., ELECTRONIC BEHAVIOR AND FIELD-EMISSION OF A-C-H-N SI HETEROJUNCTIONS/, Journal of non-crystalline solids, 230, 1998, pp. 1106-1112
Authors:
AMARATUNGA GAJ
CHHOWALLA M
LIM KG
MUNINDRADASA DAI
PRINGLE SD
BAXENDALE M
ALEXANDROU I
KIELY CJ
KEYSE B
Citation: Gaj. Amaratunga et al., ELECTRONIC-PROPERTIES OF TETRAHEDRAL AMORPHOUS-CARBON (TA-C) FILMS CONTAINING NANOTUBE REGIONS, Carbon (New York), 36(5-6), 1998, pp. 575-579
Authors:
CHHOWALLA M
AHARONOV RA
KIELY CJ
ALEXANDROU I
AMARATUNGA GAJ
Citation: M. Chhowalla et al., GENERATION AND DEPOSITION OF FULLERENE-RICH AND NANOTUBE-RICH CARBON THIN-FILMS, Philosophical magazine letters, 75(5), 1997, pp. 329-335
Authors:
CHHOWALLA M
ROBERTSON J
CHEN CW
SILVA SRP
DAVIS CA
AMARATUNGA GAJ
MILNE WI
Citation: M. Chhowalla et al., INFLUENCE OF ION ENERGY AND SUBSTRATE-TEMPERATURE ON THE OPTICAL AND ELECTRONIC-PROPERTIES OF TETRAHEDRAL AMORPHOUS-CARBON (TA-C) FILMS, Journal of applied physics, 81(1), 1997, pp. 139-145
Citation: Mmm. Bilek et al., INFLUENCE OF REACTIVE GAS ON ION ENERGY-DISTRIBUTIONS IN FILTERED CATHODIC VACUUM ARCS, Applied physics letters, 71(13), 1997, pp. 1777-1779
Authors:
CHHOWALLA M
MUNINDRADASA AI
AMARATUNGA GAJ
Citation: M. Chhowalla et al., FULLERENE AND NANOPARTICLE FORMATION IN CARBON CATHODIC ARC DEPOSITION, Applied physics letters, 70(24), 1997, pp. 3233-3235
Authors:
CHANDRA L
CHHOWALLA M
AMARATUNGA GAJ
CLYNE TW
Citation: L. Chandra et al., RESIDUAL-STRESSES AND DEBONDING OF DIAMOND FILMS ON TITANIUM-ALLOY SUBSTRATES, DIAMOND AND RELATED MATERIALS, 5(6-8), 1996, pp. 674-681
Authors:
CHHOWALLA M
DAVIS CA
WEILER M
KLEINSORGE B
AMARATUNGA GAJ
Citation: M. Chhowalla et al., STATIONARY CARBON CATHODIC ARC - PLASMA AND FILM CHARACTERIZATION, Journal of applied physics, 79(5), 1996, pp. 2237-2244
Citation: Mmm. Bilek et al., ION ENERGY AND PLASMA CHARACTERIZATION IN A SILICON FILTERED CATHODICVACUUM-ARC, Journal of applied physics, 79(3), 1996, pp. 1287-1291
Authors:
CHHOWALLA M
WEILER M
DAVIS CA
KLEINSORGE B
AMARATUNGA GAJ
Citation: M. Chhowalla et al., DEPOSITION OF SMOOTH TETRAHEDRAL AMORPHOUS-CARBON THIN-FILMS USING A CATHODIC ARC WITHOUT A MACROPARTICLE FILTER, Applied physics letters, 67(7), 1995, pp. 894-896
Citation: Bf. Coll et M. Chhowalla, MODELIZATION OF REACTION-KINETICS OF NITROGEN AND TITANIUM DURING TINARC DEPOSITION, Surface & coatings technology, 68, 1994, pp. 131-140