Authors: CRESSWELL MW ALLEN RA GUTHRIE WF SNIEGOWSKI JJ GHOSHTAGORE RN LINHOLM LW

Citation: Mw. Cresswell et al., ELECTRICAL LINEWIDTH TEST STRUCTURES FABRICATED IN MONOCRYSTALLINE FILMS FOR REFERENCE-MATERIAL APPLICATIONS, IEEE transactions on semiconductor manufacturing, 11(2), 1998, pp. 182-193

Authors: CRESSWELL MW ALLEN RA LINHOLM LW GUTHRIE WF PENZES WB GURNELL AW

Citation: Mw. Cresswell et al., HYBRID OPTICAL-ELECTRICAL OVERLAY TEST STRUCTURE, IEEE transactions on semiconductor manufacturing, 10(2), 1997, pp. 250-255

Authors: CRESSWELL MW SNIEGOWSKI JJ GHOSHTAGORE RN ALLEN RA GUTHRIE WF GURNELL AW LINHOLM LW DIXSON RG TEAGUE EC

Citation: Mw. Cresswell et al., RECENT DEVELOPMENTS IN ELECTRICAL LINEWIDTH AND OVERLAY METROLOGY FORINTEGRATED-CIRCUIT FABRICATION PROCESSES, JPN J A P 1, 35(12B), 1996, pp. 6597-6609

Authors: ALLEN RA CRESSWELL MW ELLENWOOD CH LINHOLM LW

Citation: Ra. Allen et al., THE ENHANCED VOLTAGE-DIVIDING POTENTIOMETER FOR HIGH-PRECISION FEATURE PLACEMENT METROLOGY, IEEE transactions on instrumentation and measurement, 45(1), 1996, pp. 136-141

Authors: CRESSWELL MW ALLEN RA LINHOLM LW ELLENWOOD CH PENZES WB TEAGUE EC

Citation: Mw. Cresswell et al., NEW TEST STRUCTURE FOR NANOMETER-LEVEL OVERLAY AND FEATURE-PLACEMENT METROLOGY, IEEE transactions on semiconductor manufacturing, 7(3), 1994, pp. 266-271

Authors: KHERA D CRESSWELL MW LINHOLM LW RAMANATHAN G BUZZEO J NAGARAJAN A

Citation: D. Khera et al., INCREASING PROFITABILITY AND IMPROVING SEMICONDUCTOR MANUFACTURING THROUGHPUT USING EXPERT-SYSTEMS, IEEE transactions on engineering management, 41(2), 1994, pp. 143-151