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Authors:
Akiyama, M
Alexandrou, I
Chhowalla, M
Amaratunga, GAJ
Citation: M. Akiyama et al., Optimizing hardness of CNx thin films by dc magnetron sputtering and a statistical approach, J MATER SCI, 36(22), 2001, pp. 5397-5401
Authors:
Chhowalla, M
Teo, KBK
Ducati, C
Rupesinghe, NL
Amaratunga, GAJ
Ferrari, AC
Roy, D
Robertson, J
Milne, WI
Citation: M. Chhowalla et al., Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition, J APPL PHYS, 90(10), 2001, pp. 5308-5317
Citation: M. Chhowalla et Gaj. Amaratunga, Thin films of fullerene-like MoS2 nanoparticles with ultra-low friction and wear, NATURE, 407(6801), 2000, pp. 164-167
Authors:
Rupesinghe, NL
Chhowalla, M
Amaratunga, GAJ
Weightman, P
Martin, D
Unsworth, P
Murray, J
Citation: Nl. Rupesinghe et al., Influence of the heterojunction on the field emission from tetrahedral amorphous carbon on Si, APPL PHYS L, 77(12), 2000, pp. 1908-1910
Authors:
Chhowalla, M
Ferrari, AC
Robertson, J
Amaratunga, GAJ
Citation: M. Chhowalla et al., Evolution of sp(2) bonding with deposition temperature in tetrahedral amorphous carbon studied by Raman spectroscopy, APPL PHYS L, 76(11), 2000, pp. 1419-1421
Authors:
Amaratunga, GAJ
Baxendale, M
Rupesinghe, N
Alexandrou, I
Chhowalla, M
Butler, T
Munindradasa, A
Kiley, CJ
Zhang, L
Sakai, T
Citation: Gaj. Amaratunga et al., Field emission from a new form of thin film amorphous carbon having nanoparticle inclusions and carbon nanotubes, NEW DIAM FR, 9(1), 1999, pp. 31-51