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Results:
1-7
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Results: 7
Authors:
Croffie, E
Yuan, L
Cheng, MS
Neureuther, A
Houlihan, F
Cirelli, R
Watson, P
Nalamasu, O
Gabor, A
Citation: E. Croffie et al., Modeling influence of structural changes in photoacid generators an 193 nmsingle layer resist imaging, J VAC SCI B, 18(6), 2000, pp. 3340-3344
Authors:
Pau, S
Nalamasu, O
Cirelli, R
Frackoviak, J
Timko, A
Watson, P
Klemens, F
Timp, G
Citation: S. Pau et al., Wavelength-independent optical lithography, J VAC SCI B, 18(1), 2000, pp. 317-320
Authors:
Pau, S
Nalamasu, O
Cirelli, R
Frackoviak, J
Timko, A
Watson, GP
Klemens, F
Timp, G
Citation: S. Pau et al., Sub-wavelength printing using multiple overlapping masks, MICROEL ENG, 53(1-4), 2000, pp. 119-122
Authors:
Croffie, E
Cheng, M
Neureuther, A
Cirelli, R
Houlihan, F
Sweeney, J
Watson, P
Nalamasu, O
Rushkin, I
Dimov, O
Gabor, A
Citation: E. Croffie et al., Overview of the STORM program application to 193nm singe layer resists, MICROEL ENG, 53(1-4), 2000, pp. 437-442
Authors:
Pau, S
Trimble, LE
Blatchford, JW
Watson, GP
Frackoviak, J
Cirelli, R
Nalamasu, O
Citation: S. Pau et al., Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists, J VAC SCI B, 17(6), 1999, pp. 2499-2506
Authors:
Cirelli, R
Gatti, M
Mania, A
Citation: R. Cirelli et al., On the nonlinear extension of quantum superposition and uncertainty principles, J GEOM PHYS, 29(1-2), 1999, pp. 64-86
Authors:
Liddle, JA
Johnson, JA
Cirelli, R
Mkrtchyan, MM
Novembre, AE
Peabody, ML
Citation: Ja. Liddle et al., Quantitation of latent resist images using photon tunneling microscopy, J VAC SCI B, 16(6), 1998, pp. 3651-3654
Risultati:
1-7
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