Authors:
VALADE L
DANJOY C
CHANSOU B
RIVIERE E
PELLEGATTA JL
CHOUKROUN R
CASSOUX P
Citation: L. Valade et al., EVALUATION OF THE SIMULTANEOUS USE OF CP2VME2 AND CPTICL2N(SIME3)(2) AS PRECURSORS TO CERAMIC THIN-FILMS CONTAINING TITANIUM AND VANADIUM -TOWARDS TITANIUM-VANADIUM CARBONITRIDE, Applied organometallic chemistry, 12(3), 1998, pp. 173-187
Authors:
TEYSSANDIER F
POIRIER L
SLIFIRSKI J
VALADE L
DANJOY C
REYNES A
JAUBERTEAU JL
SIBIEUDE F
Citation: F. Teyssandier et al., SPECIFIC FEATURES INDUCED BY THE VAPORIZATION OF SOLID ORGANOMETALLICCOMPOUNDS USED AS OMCVD PRECURSORS FOR DEPOSITION IN THE V-C-N CHEMICAL-SYSTEM, Annales de chimie, 23(5-6), 1998, pp. 655-666
Authors:
VALADE L
CHOUKROUN R
DANJOY C
CHANSOU B
DECARO D
CASSOUX P
Citation: L. Valade et al., POTENTIALITY OF THE FORMATION OF THIN-FILMS WITHIN THE TI-V-C-N CERAMIC SYSTEM USING MOLECULAR PRECURSORS, Annales de chimie, 23(5-6), 1998, pp. 721-732