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Results: 1-9 |
Results: 9

Authors: KESSELS WMM GIELEN JWAM VANDESANDEN MCM VANIJZENDOORN LJ DEKEMPENEER EHA SCHRAM DC
Citation: Wmm. Kessels et al., A MODEL FOR THE DEPOSITION OF A-C-H USING AN EXPANDING THERMAL ARC, Surface & coatings technology, 98(1-3), 1998, pp. 1584-1589

Authors: DEKEMPENEER EHA KUYPERS S VERCAMMEN K MENEVE J SMEETS J GIBSON PN GISSLER W
Citation: Eha. Dekempeneer et al., SCRATCH-RESISTANT TRANSPARENT BORON-NITRIDE FILMS, Surface & coatings technology, 101(1-3), 1998, pp. 45-48

Authors: DEKEMPENEER EHA WAGNER V VANIJZENDOORN LJ MENEVE J KUYPERS S SMEETS J GEURTS J CAUDANO R
Citation: Eha. Dekempeneer et al., TRIBOLOGICAL AND STRUCTURAL-PROPERTIES OF AMORPHOUS B-N-C COATINGS, Surface & coatings technology, 86-7(1-3), 1996, pp. 581-585

Authors: DEKEMPENEER EHA MENEVE J KUYPERS S SMEETS J
Citation: Eha. Dekempeneer et al., TRIBOLOGICAL PROPERTIES OF RF PACVD AMORPHOUS B-N-C COATINGS, Thin solid films, 282(1-2), 1996, pp. 331-333

Authors: GIELEN JWAM KLEUSKENS PRM VANDESANDEN MCM VANIJZENDOORN LJ SCHRAM DC DEKEMPENEER EHA MENEVE J
Citation: Jwam. Gielen et al., OPTICAL AND MECHANICAL-PROPERTIES OF PLASMA-BEAM-DEPOSITED AMORPHOUS HYDROGENATED CARBON, Journal of applied physics, 80(10), 1996, pp. 5986-5995

Authors: DEKEMPENEER EHA MENEVE J KUYPERS S SMEETS J
Citation: Eha. Dekempeneer et al., MICROSTRUCTURE AND MECHANICAL-PROPERTIES OF A-B1-XNX-H FILMS PREPAREDBY RF PACVD, Surface & coatings technology, 74-5(1-3), 1995, pp. 399-404

Authors: DEKEMPENEER EHA SMEETS J MENEVE J EERSELS L JACOBS R
Citation: Eha. Dekempeneer et al., RF PACVD DIAMOND-LIKE CARBON COATINGS ON INSULATING OBJECTS, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 613-617

Authors: DEKEMPENEER EHA MENEVE J SMEETS J KUYPERS S EERSELS L JACOBS R
Citation: Eha. Dekempeneer et al., STRUCTURAL, MECHANICAL AND TRIBOLOGICAL PROPERTIES OF PLASMA-ASSISTEDCHEMICALLY VAPOR-DEPOSITED HYDROGENATED CXN1-X-H FILMS, Surface & coatings technology, 68, 1994, pp. 621-625

Authors: DEKEMPENEER EHA SMEETS J MENEVE J EERSELS L JACOBS R
Citation: Eha. Dekempeneer et al., PLASMA PROCESSES IN METHANE DISCHARGES DURING RF PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF A-CH THIN-FILMS, Thin solid films, 241(1-2), 1994, pp. 269-273
Risultati: 1-9 |