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LANGOUCHE G
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DEWACHTER J
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Citation: Mf. Wu et al., ION-BEAM SYNTHESIS OF BURIED AND SURFACE NICKEL SILICIDES DURING A SINGLE IMPLANTATION STEP, Applied surface science, 73, 1993, pp. 246-252
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PATTYN H
LANGOUCHE G
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BENDER H
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BENDER H
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LANGOUCHE G
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Citation: J. Vanhellemont et al., IMPLANTATION TEMPERATURE-DEPENDENT DISTRIBUTION OF NISI2 FORMED BY ION-BEAM SYNTHESIS IN SILICON, Applied physics letters, 62(22), 1993, pp. 2795-2797