Citation: Vk. Mathews et al., PHYSICAL AND ELECTRICAL CHARACTERISTICS OF THIN SILICON-NITRIDE DIELECTRIC FILMS DEPOSITED ON SMOOTH AND RUGGED POLYCRYSTALLINE SILICON AFTER RAPID THERMAL NITRIDATION, Journal of the Electrochemical Society, 141(4), 1994, pp. 1066-1070
Citation: Rps. Thakur et al., EFFECTS OF WATER BOW AND WARPAGE ON THE INTEGRITY OF THIN GATE OXIDES, Applied physics letters, 64(25), 1994, pp. 3428-3430
Authors:
LO GQ
KWONG DL
MATHEWS VK
FAZAN PC
DITALI A
Citation: Gq. Lo et al., DYNAMIC-STRESS-INDUCED DIELECTRIC-BREAKDOWN IN ULTRATHIN NITRIDE OXIDE STACKED FILMS DEPOSITED ON RUGGED POLYSILICON, IEEE electron device letters, 13(4), 1992, pp. 183-185