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Results: 26-50/75
Authors:
BULKIN P
BERTRAND N
DREVILLON B
Citation: P. Bulkin et al., DEPOSITION OF SIO2 IN INTEGRATED DISTRIBUTED ELECTRON-CYCLOTRON-RESONANCE MICROWAVE REACTOR, Thin solid films, 296(1-2), 1997, pp. 66-68
Authors:
BRENOT R
VANDERHAGHEN R
DREVILLON B
FRENCH I
CABARROCAS PRI
Citation: R. Brenot et al., TIME-RESOLVED MICROWAVE CONDUCTIVITY MEASUREMENTS FOR THE CHARACTERIZATION OF TRANSPORT-PROPERTIES IN THIN-FILM MICROCRYSTALLINE SILICON, Thin solid films, 296(1-2), 1997, pp. 94-97
Authors:
COMPAIN E
DREVILLON B
Citation: E. Compain et B. Drevillon, COMPLETE HIGH-FREQUENCY MEASUREMENT OF MUELLER MATRICES BASED ON A NEW COUPLED-PHASE MODULATOR, Review of scientific instruments, 68(7), 1997, pp. 2671-2680
Authors:
KILDEMO M
BULKIN P
DREVILLON B
HUNDERI O
Citation: M. Kildemo et al., REAL-TIME CONTROL BY MULTIWAVELENGTH ELLIPSOMETRY OF PLASMA-DEPOSITEDMULTILAYERS ON GLASS BY USE OF AN INCOHERENT-REFLECTION MODEL, Applied optics, 36(25), 1997, pp. 6352-6359
Authors:
KILDEMO M
DREVILLON B
BENFERHAT R
Citation: M. Kildemo et al., REAL-TIME CONTROL OF PLASMA-DEPOSITED MULTILAYERS BY ELLIPSOMETRY, Le Vide, 52(280), 1996, pp. 232
Authors:
VALLON S
DREVILLON B
PONCINEPAILLARD F
KLEMBERGSAPIEHA JE
MARTINU L
Citation: S. Vallon et al., ARGON PLASMA TREATMENT OF POLYCARBONATE - IN-SITU SPECTROELLIPSOMETRYSTUDY AND POLYMER CHARACTERIZATIONS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(6), 1996, pp. 3194-3201
Authors:
BOUREE JE
GODET C
ETEMADI R
DREVILLON B
Citation: Je. Bouree et al., DUAL-MODE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION (PECVD) OF POLYMER-LIKE A-C-H FILMS - VIBRATIONAL AND OPTICAL-PROPERTIES, Synthetic metals, 76(1-3), 1996, pp. 191-194
Authors:
ETEMADI R
GODET C
PERRIN J
BOUREE J
DREVILLON B
CLERC C
Citation: R. Etemadi et al., HYDROGEN INCORPORATION IN DUAL-MODE PECVD AMORPHOUS-SILICON OXIDE THIN-FILMS, Surface & coatings technology, 80(1-2), 1996, pp. 8-12
Authors:
VALLON S
HOFRICHTER A
GUYOT L
DREVILLON B
KLEMBERGSAPIEHA JE
MARTINU L
PONCINEPAILLARD F
Citation: S. Vallon et al., ADHESION MECHANISMS OF SILICA LAYERS ON PLASMA-TREATED POLYMERS .1. POLYCARBONATE, Journal of adhesion science and technology, 10(12), 1996, pp. 1287-1311
Authors:
VALLON S
BRENOT R
HOFRICHTER A
DREVILLON B
GHEORGHIU A
SENEMAUD C
KLEMBERGSAPIEHA JE
MARTINU L
PONCINEPAILLARD F
Citation: S. Vallon et al., ADHESION MECHANISMS OF SILICA LAYERS ON PLASMA-TREATED POLYMERS .2. POLYPROPYLENE, Journal of adhesion science and technology, 10(12), 1996, pp. 1313-1332
Authors:
OSSIKOVSKI R
DREVILLON B
Citation: R. Ossikovski et B. Drevillon, INFRARED-ELLIPSOMETRY EVIDENCE OF DISORDER-INDUCED VIBRATIONAL FREQUENCY-SHIFTS IN HYDROGENATED-AMORPHOUS-SILICON THIN-FILMS, Physical review. B, Condensed matter, 54(15), 1996, pp. 10530-10542
Authors:
KILDEMO M
DENIAU S
BULKIN P
DREVILLON B
Citation: M. Kildemo et al., REAL-TIME CONTROL OF THE GROWTH OF SILICON ALLOY MULTILAYERS BY MULTIWAVELENGTH ELLIPSOMETRY, Thin solid films, 291, 1996, pp. 46-50
Authors:
VALLON S
HOFRICHTER A
DREVILLON B
KLEMBERGSAPIEHA JE
MARTINU L
PONCINEPAILLARD F
Citation: S. Vallon et al., IMPROVEMENT OF THE ADHESION OF SILICA LAYERS TO POLYPROPYLENE INDUCEDBY NITROGEN PLASMA TREATMENT, Thin solid films, 291, 1996, pp. 68-73
Authors:
BERTRAND N
DREVILLON B
KLEMBERGSAPIEHA JE
MARTINU L
Citation: N. Bertrand et al., IN-SITU IR ELLIPSOMETRY STUDY OF THE ADHESION AND GROWTH OF PLASMA-DEPOSITED SILICA THIN-FILMS ON STAINLESS-STEEL SUBSTRATES, Thin solid films, 291, 1996, pp. 264-270
Authors:
JAMA C
DESSAUX O
GOUDMAND P
MUTEL B
GENGEMBRE L
DREVILLON B
VALLON S
GRIMBLOT J
Citation: C. Jama et al., SURFACE MODIFICATIONS OF POLYCARBONATE (PC) AND POLYETHYLENE TEREPHTALATE (PET) BY COLD REMOTE NITROGEN PLASMA (CRNP), Surface science, 352, 1996, pp. 490-494
Authors:
KILDEMO M
DREVILLON B
Citation: M. Kildemo et B. Drevillon, REAL-TIME MONITORING OF THE GROWTH OF TRANSPARENT THIN-FILMS BY SPECTROSCOPIC ELLIPSOMETRY, Review of scientific instruments, 67(5), 1996, pp. 1956-1960
Authors:
BOUREE JE
GODET C
DREVILLON B
ETEMADI R
HEITZ T
CERNOGORA J
FAVE JL
Citation: Je. Bouree et al., OPTICAL AND LUMINESCENCE PROPERTIES OF POLYMER-LIKE A-C-H FILMS DEPOSITED IN A DUAL-MODE PECVD REACTOR, Journal of non-crystalline solids, 200, 1996, pp. 623-627
Authors:
CABARROCAS PRI
LAYADI N
DREVILLON B
SOLOMON I
Citation: Pri. Cabarrocas et al., MICROCRYSTALLINE SILICON GROWTH BY THE LAYER-BY-LAYER TECHNIQUE - LONG-TERM EVOLUTION AND NUCLEATION MECHANISMS, Journal of non-crystalline solids, 200, 1996, pp. 871-874
Authors:
OSSIKOVSKI R
DREVILLON B
FIRON M
Citation: R. Ossikovski et al., INFRARED ELLIPSOMETRY STUDY OF THE THICKNESS-DEPENDENT VIBRATION FREQUENCY-SHIFTS IN SILICON DIOXIDE FILMS, Journal of the Optical Society of America. A, Optics, image science,and vision., 12(8), 1995, pp. 1797-1804
Authors:
LAYADI N
CABARROCAS PRI
DREVILLON B
SOLOMON I
Citation: N. Layadi et al., REAL-TIME SPECTROSCOPIC ELLIPSOMETRY STUDY OF THE GROWTH OF AMORPHOUSAND MICROCRYSTALLINE SILICON THIN-FILMS PREPARED BY ALTERNATING SILICON DEPOSITION AND HYDROGEN PLASMA TREATMENT, Physical review. B, Condensed matter, 52(7), 1995, pp. 5136-5143
Authors:
VALLON S
COMPAIN E
DREVILLON B
Citation: S. Vallon et al., IMPROVEMENTS OF FOURIER-TRANSFORM PHASE-MODULATED ELLIPSOMETRY, Review of scientific instruments, 66(5), 1995, pp. 3269-3272
Authors:
VANDERHAGHEN R
CUEILLE S
DREVILLON B
OSSIKOVSKI R
Citation: R. Vanderhaghen et al., MODULATED PHOTOELLIPSOMETRY - APPLICATION TO THE MEASUREMENT OF GAAS INTERNAL FIELD, Physica status solidi. a, Applied research, 152(1), 1995, pp. 85-93
Authors:
ETEMADI R
GODET C
KILDEMO M
BOUREE JE
BRENOT R
DREVILLON B
Citation: R. Etemadi et al., DUAL-MODE RADIO-FREQUENCY MICROWAVE PLASMA DEPOSITION OF AMORPHOUS-SILICON OXIDE THIN-FILMS, Journal of non-crystalline solids, 187, 1995, pp. 70-74
Authors:
KILDEMO M
DREVILLON B
Citation: M. Kildemo et B. Drevillon, REAL-TIME MONITORING OF THE GROWTH OF TRANSPARENT THIN-FILMS BY SPECTROSCOPIC ELLIPSOMETRY, Applied physics letters, 67(7), 1995, pp. 918-920
Authors:
CABARROCAS PRI
LAYADI N
HEITZ T
DREVILLON B
SOLOMON I
Citation: Pri. Cabarrocas et al., SUBSTRATE SELECTIVITY IN THE FORMATION OF MICROCRYSTALLINE SILICON - MECHANISMS AND TECHNOLOGICAL CONSEQUENCES, Applied physics letters, 66(26), 1995, pp. 3609-3611