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Results: 1-13 |
Results: 13

Authors: Debal, F Bretagne, J Dauchot, JP Hecq, M Wautelet, M
Citation: F. Debal et al., On the role of plasma-surface interactions in dc magnetron discharges in Ar-N-2 gas mixtures, PLASMA SOUR, 10(1), 2001, pp. 30-37

Authors: Vallee, R Wautelet, M Dauchot, JP Hecq, M
Citation: R. Vallee et al., Size and segregation effects on the phase diagrams of nanoparticles of binary systems, NANOTECHNOL, 12(1), 2001, pp. 68-74

Authors: Wautelet, M Dauchot, JP Hecq, M
Citation: M. Wautelet et al., On the migration of defects and impurities in microelectromechanical systems subject to a large number of light pulses, APPL PHYS A, 73(4), 2001, pp. 425-427

Authors: Snyders, R Wautelet, M Gouttebaron, R Dauchot, JP Hecq, M
Citation: R. Snyders et al., Correlation between the gas composition and the stoichiometry of SnOx films prepared by DC magnetron reactive sputtering, SURF COAT, 142, 2001, pp. 187-191

Authors: Debal, F Wautelet, M Bretagne, J Dauchot, JP Hecq, M
Citation: F. Debal et al., Spatially-resolved spectroscopic optical emission of dc-magnetron sputtering discharges in argon-nitrogen gas mixtures, PLASMA SOUR, 9(2), 2000, pp. 152-160

Authors: Wautelet, M Dauchot, JP Hecq, M
Citation: M. Wautelet et al., Phase diagrams of small particles of binary systems: a theoretical approach, NANOTECHNOL, 11(1), 2000, pp. 6-9

Authors: Dony, MF Dauchot, JP Wautelet, M Hecq, M Ricard, A
Citation: Mf. Dony et al., Diagnostics by optical absorption of sputtered atom density in magnetron discharges, J VAC SCI A, 18(3), 2000, pp. 809-813

Authors: Gouttebaron, R Cornelissen, D Snyders, R Dauchot, JP Wautelet, M Hecq, M
Citation: R. Gouttebaron et al., XPS study of TiOx thin films prepared by d.c. magnetron sputtering in Ar-O-2 gas mixtures, SURF INT AN, 30(1), 2000, pp. 527-530

Authors: Dauchot, JP Gouttebaron, R Cornelissen, D Wautelet, M Hecq, M
Citation: Jp. Dauchot et al., Synthesis of stoichiometric zirconium nitride by d.c. reactive magnetron sputtering pulsed at low frequency: characterization by ESCA, SIMS and electron microprobe, SURF INT AN, 30(1), 2000, pp. 607-611

Authors: Vancoppenolle, V Jouan, PY Wautelet, M Dauchot, JP Hecq, M
Citation: V. Vancoppenolle et al., Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target, J VAC SCI A, 17(6), 1999, pp. 3317-3321

Authors: Debal, F Wautelet, M Dauchot, JP Hecq, M
Citation: F. Debal et al., Spectroscopic optical emission tomography of direct-current magnetron sputtering discharges in argon-nitrogen gas mixtures, SURF COAT, 119, 1999, pp. 927-932

Authors: Vancoppenolle, V Jouan, PY Wautelet, M Dauchot, JP Hecq, M
Citation: V. Vancoppenolle et al., D.c. magnetron sputtering deposition of TiO(2)films in argon-oxygen gas mixtures: theory and experiments, SURF COAT, 119, 1999, pp. 933-937

Authors: Molle, C Beauvois, A Wautelet, M Dauchot, JP Hecq, M
Citation: C. Molle et al., Characterization of an inductively amplified magnetron plasma by glow discharge mass spectrometry, VACUUM, 53(1-2), 1999, pp. 17-20
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