Authors: Dinescu, G de Graaf, A Aldea, E van de Sanden, MCM

Citation: G. Dinescu et al., Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: 1. Ar/N-2/C2H2 plasma, PLASMA SOUR, 10(3), 2001, pp. 513-523

Authors: de Graaf, A Aldea, E Dinescu, G van de Sanden, MCM

Citation: A. De Graaf et al., Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N-2 plasma with graphite nozzle, PLASMA SOUR, 10(3), 2001, pp. 524-529

Authors: Mitu, B Dinescu, G Dinescu, M Ferrari, A Balucani, M Lamedica, G Dementjev, AP Maslakov, KI

Citation: B. Mitu et al., Multilayer structures induced by plasma and laser beam treatments on a-Si : H and a-SiC : H thin films, THIN SOL FI, 383(1-2), 2001, pp. 230-234

Authors: Dinescu, G Mitu, B Aldea, E Dinescu, M

Citation: G. Dinescu et al., A double-chamber capacitively coupled RF discharge for plasma assisting deposition techniques, VACUUM, 56(1), 2000, pp. 83-86

Authors: de Graaf, A Dinescu, G Longueville, JL van de Sanden, MCM Schram, DC Dekempeneer, EHA van Ijzendoorn, LJ

Citation: A. De Graaf et al., Amorphous hydrogenated carbon nitride films deposited via an expanding thermal plasma at high growth rates, THIN SOL FI, 333(1-2), 1998, pp. 29-34