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Results: 1-9 |
Results: 9
LIFE EVENT STRESS AND PSYCHOPHYSIOLOGICAL REACTIVITY
Authors: LINDSAY DL HOVANITZ CA REYNOLDS DJ LOHMUELLER MA EARLY K ALTUM S
Citation: Dl. Lindsay et al., LIFE EVENT STRESS AND PSYCHOPHYSIOLOGICAL REACTIVITY, Applied psychophysiology and biofeedback, 23(2), 1998, pp. 120-120
CHRONIC AND ACUTE NEGLECTED CHILDREN - PSYCHOLOGICAL VARIABLES
Authors: PERETTI PO EARLY K CHMURA J
Citation: Po. Peretti et al., CHRONIC AND ACUTE NEGLECTED CHILDREN - PSYCHOLOGICAL VARIABLES, Social behavior and personality, 26(2), 1998, pp. 175-180
PSYCHOPHYSIOLOGICAL CORRELATES OF CUED-RECALL OF A STRESSOR
Authors: HOVANITZ C CHRISTIANSON A REYNOLDS D STOKESCROWE L COTE M LOHMUELLER MA EARLY K WARREN C CARVER D
Citation: C. Hovanitz et al., PSYCHOPHYSIOLOGICAL CORRELATES OF CUED-RECALL OF A STRESSOR, Biofeedback and self-regulation, 21(4), 1996, pp. 349-349
CATALYTIC HYDRODECHLORINATION OF 1,1-DICHLOROTETRAFLUOROETHANE BY PD AL2O3/
Authors: KARPINSKI Z EARLY K DITRI JL
Citation: Z. Karpinski et al., CATALYTIC HYDRODECHLORINATION OF 1,1-DICHLOROTETRAFLUOROETHANE BY PD AL2O3/, Journal of catalysis, 164(2), 1996, pp. 378-386
NOVEL POSTEXPOSURE BAKE SIMULATOR - FIRST RESULTS
Authors: CAPODIECI L KRASNOPEROVA A CERRINA F LYONS C SPENCE C EARLY K
Citation: L. Capodieci et al., NOVEL POSTEXPOSURE BAKE SIMULATOR - FIRST RESULTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2963-2967
REPAIR OF SOFT-X-RAY OPTICAL-ELEMENTS BY STRIPPING AND REDEPOSITION OF MO SI REFLECTIVE COATINGS/
Authors: EARLY K WINDT DL WASKIEWICZ WK WOOD OR TENNANT DM
Citation: K. Early et al., REPAIR OF SOFT-X-RAY OPTICAL-ELEMENTS BY STRIPPING AND REDEPOSITION OF MO SI REFLECTIVE COATINGS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2926-2929
CHEMICALLY AMPLIFIED SOFT-X-RAY RESISTS - SENSITIVITY, RESOLUTION, AND MOLECULAR PHOTODESORPTION
Authors: KUBIAK GD HWANG RQ SCHULBERG MT TICHENOR DA EARLY K
Citation: Gd. Kubiak et al., CHEMICALLY AMPLIFIED SOFT-X-RAY RESISTS - SENSITIVITY, RESOLUTION, AND MOLECULAR PHOTODESORPTION, Applied optics, 32(34), 1993, pp. 7036-7043
CHARACTERIZATION OF AZ PN114 RESIST FOR SOFT-X-RAY PROJECTION LITHOGRAPHY
Authors: EARLY K TENNANT DM JEON DY MULGREW PP MACDOWELL AA WOOD OR KUBIAK GD TICHENOR DA
Citation: K. Early et al., CHARACTERIZATION OF AZ PN114 RESIST FOR SOFT-X-RAY PROJECTION LITHOGRAPHY, Applied optics, 32(34), 1993, pp. 7044-7049
SOFT-X-RAY PROJECTION IMAGING WITH A 1 1 RING-FIELD OPTIC/
Authors: MACDOWELL AA BJORKHOLM JE EARLY K FREEMAN RR HIMEL MD MULGREW PP SZETO LH TAYLOR DW TENNANT DM WOOD OR BOKOR J EICHNER L JEWELL TE WASKIEWICZ WK WHITE DL WINDT DL DSOUZA RM SILFVAST WT ZERNIKE F
Citation: Aa. Macdowell et al., SOFT-X-RAY PROJECTION IMAGING WITH A 1 1 RING-FIELD OPTIC/, Applied optics, 32(34), 1993, pp. 7072-7078
Risultati: 1-9 |