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Results:
1-11
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Results: 11
Authors:
QUAAS M
EGGS C
WULFF H
Citation: M. Quaas et al., STRUCTURAL STUDIES OF ITO THIN-FILMS WITH THE RIETVELD METHOD, Thin solid films, 332(1-2), 1998, pp. 277-281
Authors:
EGGS C
WULFF H
HIPPLER R
Citation: C. Eggs et al., LOW-ENERGY ION-BOMBARDMENT OF TI AND TINX FILMS, Fresenius' journal of analytical chemistry, 358(1-2), 1997, pp. 275-277
Authors:
WULFF H
EGGS C
Citation: H. Wulff et C. Eggs, INVESTIGATION OF STORED ENERGY IN PLASMA-DEPOSITED TINX FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(6), 1997, pp. 2938-2944
Authors:
ROHDE D
KERSTEN H
EGGS C
HIPPLER R
Citation: D. Rohde et al., THIN-FILM DEPOSITION BY REACTIVE MAGNETRON SPUTTERING - ON THE INFLUENCE OF TARGET OXIDATION AND ITS EFFECT ON SURFACE-PROPERTIES, Thin solid films, 305(1-2), 1997, pp. 164-171
Authors:
TILLACK B
RICHTER HH
RITTER G
WOLFF A
MORGENSTERN G
EGGS C
Citation: B. Tillack et al., MONITORING OF DEPOSITION AND DRY-ETCHING OF SI SIGE MULTIPLE STACKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(1), 1996, pp. 102-105
Authors:
EGGS C
KERSTEN H
WAGNER HE
WULFF H
Citation: C. Eggs et al., PLASMA WALL INTERACTION FOR TINX FILM DEPOSITION IN A HOLLOW-CATHODE ARC-DISCHARGE, Thin solid films, 291, 1996, pp. 381-385
Authors:
STEFFEN H
EGGS C
KERSTEN H
Citation: H. Steffen et al., DEPOSITION OF TITANIUM IN A HOLLOW-CATHODE ARC-DISCHARGE - CORRELATION BETWEEN DEPOSITION CONDITIONS AND FILM PROPERTIES, Thin solid films, 291, 1996, pp. 386-389
Authors:
STEFFEN H
SCHWARZ J
KERSTEN H
BEHNKE JF
EGGS C
Citation: H. Steffen et al., PROCESS-CONTROL OF RF PLASMA-ASSISTED SURFACE CLEANING, Thin solid films, 283(1-2), 1996, pp. 158-164
Authors:
WULFF H
KLIMKE J
STEFFEN H
EGGS C
Citation: H. Wulff et al., INVESTIGATION OF THE TITANIUM SILICIDE FORMATION IN PLASMA ACTIVATED PHYSICAL VAPOR-DEPOSITION, Thin solid films, 261(1-2), 1995, pp. 25-30
Authors:
RICHTER HH
WOLFF A
TILLACK B
KRUGER D
HOPPNER K
EGGS C
Citation: Hh. Richter et al., STUDIES OF SIGE ALLOY SURFACES AFTER REACTIVE ION ETCHING, Physica status solidi. a, Applied research, 152(2), 1995, pp. 443-450
Authors:
KERSTEN H
BEHNKE JF
EGGS C
Citation: H. Kersten et al., INVESTIGATIONS ON PLASMA-ASSISTED SURFACE CLEANING OF ALUMINUM IN AN OXYGEN GLOW-DISCHARGE, Contributions to Plasma Physics, 34(4), 1994, pp. 563-574
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1-11
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