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LAURIKAINEN P
ORAVA R
OSTONEN R
PYYHTIA J
SCHULMAN T
SPARTIOTIS C
HIETANEN I
MATIKKALA M
ERANEN S
VIROLAINEN T
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Authors:
XIA Z
SAARILAHTI J
RISTOLAINEN E
ERANEN S
RONKAINEN H
KUIVALAINEN P
PAINE D
TUOMI T
Citation: Z. Xia et al., AMORPHIZATION OF SILICON BY HIGH-DOSE GERMANIUM ION-IMPLANTATION WITHNO EXTERNAL COOLING MECHANISM, Applied surface science, 78(3), 1994, pp. 321-330
Authors:
XIA Z
SAARILAHTI J
RONKAINEN H
ERANEN S
SUNI I
MOLARIUS J
KUIVALAINEN P
RISTOLAINEN E
TUOMI T
Citation: Z. Xia et al., RAPID THERMAL ANNEALING OF SI1-XGEX LAYERS FORMED BY GERMANIUM ION-IMPLANTATION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 88(3), 1994, pp. 247-254