Citation: R. Mientus et K. Ellmer, Reactive magnetron sputtering of tin-doped indium oxide (ITO): influence of argon pressure and plasma excitation mode, SURF COAT, 142, 2001, pp. 748-754
Citation: K. Ellmer et al., In situ investigation by energy dispersive X-ray diffraction (EDXRD) of the growth of magnetron sputtered ITO films, SURF COAT, 142, 2001, pp. 1094-1099
Citation: K. Ellmer et al., Setup for in situ X-ray diffraction studies of thin film growth by magnetron sputtering, NUCL INST A, 467, 2001, pp. 1041-1044
Citation: K. Ellmer, Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties, J PHYS D, 33(4), 2000, pp. R17-R32
Citation: J. Hinze et K. Ellmer, In situ measurement of mechanical stress in polycrystalline zinc-oxide thin films prepared by magnetron sputtering, J APPL PHYS, 88(5), 2000, pp. 2443-2450
Citation: R. Mientus et K. Ellmer, Reactive DC magnetron sputtering of elemental targets in Ar/N-2 mixtures: relation between the discharge characteristics and the heat of formation ofthe corresponding nitrides, SURF COAT, 119, 1999, pp. 1093-1101
Citation: K. Ellmer et R. Mientus, Calorimetric measurements with a heat flux transducer of the total power influx onto a substrate during magnetron sputtering, SURF COAT, 119, 1999, pp. 1102-1106
Authors:
Oertel, J
Ellmer, K
Bohne, W
Rohrich, J
Tributsch, H
Citation: J. Oertel et al., Growth of n-type polycrystalline pyrite (FeS2) films by metalorganic chemical vapour deposition and their electrical characterization, J CRYST GR, 199, 1999, pp. 1205-1210
Citation: Am. Chaparro et al., Comparative study of charge carrier reactivity in single crystalline and polycrystalline ZnO electrodes via photoinduced microwave electrochemical technique, ELECTR ACT, 44(10), 1999, pp. 1655-1665