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Aderhold, J
Davydov, VY
Fedler, F
Klausing, H
Mistele, D
Rotter, T
Semchinova, O
Stemmer, J
Graul, J
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Authors:
Rotter, T
Mistele, D
Stemmer, J
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Schwegler, V
Paprotta, S
Fedler, F
Klausing, H
Semchinova, OK
Aderhold, J
Graul, J
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Authors:
Klausing, H
Aderhold, J
Fedler, F
Mistele, D
Stemmer, J
Semchinova, O
Graul, J
Danhardt, J
Panzer, S
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Authors:
Stemmer, J
Fedler, F
Klausing, H
Mistele, D
Rotter, T
Semchinova, O
Aderhold, J
Sanchez, AM
Pacheco, FJ
Molina, SI
Fehrer, M
Hommel, D
Graul, J
Citation: J. Stemmer et al., High temperature AlN intermediate layer in GaN grown by molecular beam epitaxy, J CRYST GR, 216(1-4), 2000, pp. 15-20
Authors:
Emtsev, VV
Davydov, VY
Lundin, VV
Poloskin, DS
Aderhold, J
Klausing, H
Mistele, D
Rotter, T
Stemmer, J
Fedler, F
Semchinova, O
Graul, J
Citation: Vv. Emtsev et al., Annealing behaviour of electrically active point defects in gamma-irradiated n-GaN films, J CRYST GR, 210(1-3), 2000, pp. 273-277
Authors:
Rotter, T
Mistele, D
Stemmer, J
Fedler, F
Aderhold, J
Graul, J
Schwegler, V
Kirchner, C
Kamp, M
Heuken, M
Citation: T. Rotter et al., Photoinduced oxide film formation on n-type GaN surfaces using alkaline solutions, APPL PHYS L, 76(26), 2000, pp. 3923-3925
Authors:
Cho, YH
Fedler, F
Hauenstein, RJ
Park, GH
Song, JJ
Keller, S
Mishra, UK
DenBaars, SP
Citation: Yh. Cho et al., High resolution x-ray analysis of pseudomorphic InGaN/GaN multiple quantumwells: Influence of Si doping concentration, J APPL PHYS, 85(5), 1999, pp. 3006-3008
Citation: Ml. O'Steen et al., Effect of substrate temperature and V/III flux ratio on In incorporation for InGaN/GaN heterostructures grown by plasma-assisted molecular-beam epitaxy, APPL PHYS L, 75(15), 1999, pp. 2280-2282