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Citation: Q. Wahab et al., GROWTH OF EPITAXIAL 3C-SIC FILMS ON (111) SILICON SUBSTRATES AT 850-DEGREES-C BY REACTIVE MAGNETRON SPUTTERING, Journal of applied physics, 74(3), 1993, pp. 1663-1669
Citation: Br. Stoner et al., HALL-EFFECT MEASUREMENTS ON BORON-DOPED, HIGHLY ORIENTED DIAMOND FILMS GROWN ON SILICON VIA MICROWAVE PLASMA CHEMICAL-VAPOR DEPOSITION, Applied physics letters, 62(19), 1993, pp. 2347-2349