Authors: GRABIEC PB GOTSZALK T SHI F HUDEK P DUMANIA P RANGELOW IW

Citation: Pb. Grabiec et al., THE INTEGRATION OF CMOS WITH PLASMA-ENHANCED MICROMACHINING, Surface & coatings technology, 97(1-3), 1997, pp. 475-480

Authors: GRABIEC PB SHI F HUDEK P GOTSZALK T ZABROWSKI M DUMANIA P RANGELOW IW

Citation: Pb. Grabiec et al., SCANNING PROBE SHARP TIP FORMATION FOR IC INTEGRATION USING MESA TECHNIQUE, Microelectronic engineering, 35(1-4), 1997, pp. 329-332

Authors: GRABIEC PB ZAGOZDZONWOSIK W LUX G

Citation: Pb. Grabiec et al., KINETICS OF PHOSPHORUS PROXIMITY RAPID THERMAL-DIFFUSION USING SPIN-ON DOPANT SOURCE FOR SHALLOW JUNCTIONS FABRICATION, Journal of applied physics, 78(1), 1995, pp. 204-211

Authors: ZAGOZDZONWOSIK W GRABIEC PB LUX G

Citation: W. Zagozdzonwosik et al., SILICON DOPING FROM PHOSPHORUS SPIN-ON DOPANT SOURCES IN PROXIMITY RAPID THERMAL-DIFFUSION, Journal of applied physics, 75(1), 1994, pp. 337-344

Authors: ZAGOZDZONWOSIK W GRABIEC PB LUX G

Citation: W. Zagozdzonwosik et al., FABRICATION OF SUBMICRON JUNCTIONS - PROXIMITY RAPID THERMAL-DIFFUSION OF PHOSPHORUS, BORON, AND ARSENIC, I.E.E.E. transactions on electron devices, 41(12), 1994, pp. 2281-2290