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Results: 1-25 | 26-29
Results: 1-25/29
ZNSE ZNS SINGLE QUANTUM-WIRE HETEROSTRUCTURES EMITTING IN THE NEAR-ULTRAVIOLET REGION/
Authors: RINALDI R TURCO C LOVERGINE N CINGOLANI R VASANELLI L DIFABRIZIO E GRELLA L GENTILI M
Citation: R. Rinaldi et al., ZNSE ZNS SINGLE QUANTUM-WIRE HETEROSTRUCTURES EMITTING IN THE NEAR-ULTRAVIOLET REGION/, PHYSICS OF LOW-DIMENSIONAL STRUCTURES, 1-2, 1998, pp. 199-204
FABRICATION OF PHASE MASKS WITH SUBHALF MICRON RESOLUTION BY ELECTRON-BEAM LITHOGRAPHY
Authors: DIFABRIZIO E GRELLA L GENTILI M BACIOCCHI M MASTROGIACOMO L VANINETTI F FONTANA F
Citation: E. Difabrizio et al., FABRICATION OF PHASE MASKS WITH SUBHALF MICRON RESOLUTION BY ELECTRON-BEAM LITHOGRAPHY, Microelectronic engineering, 42, 1998, pp. 121-124
MICROPHOTONIC DEVICES FABRICATED BY SILICON MICROMACHINING TECHNIQUES
Authors: DIFABRIZIO E BACIOCCHI M GENTILI M GRELLA L MASTROGIACOMO L
Citation: E. Difabrizio et al., MICROPHOTONIC DEVICES FABRICATED BY SILICON MICROMACHINING TECHNIQUES, JPN J A P 1, 36(12B), 1997, pp. 7757-7762
FABRICATION OF 5 NM RESOLUTION ELECTRODES FOR MOLECULAR DEVICES BY MEANS OF ELECTRON-BEAM LITHOGRAPHY
Authors: DIFABRIZIO E GRELLA L GENTILI M BACIOCCHI M MASTROGIACOMO L MORALES P
Citation: E. Difabrizio et al., FABRICATION OF 5 NM RESOLUTION ELECTRODES FOR MOLECULAR DEVICES BY MEANS OF ELECTRON-BEAM LITHOGRAPHY, JPN J A P 2, 36(1AB), 1997, pp. 70-72
NANOLITHOGRAPHY PERFORMANCES OF ULTRAVIOLET-III CHEMICALLY AMPLIFIED POSITIVE RESIST
Authors: GRELLA L GENTILI M DIFABRIZIO E BACIOCCHI M MASTROGIACOMO L MAGGIORA R SCOPA L
Citation: L. Grella et al., NANOLITHOGRAPHY PERFORMANCES OF ULTRAVIOLET-III CHEMICALLY AMPLIFIED POSITIVE RESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2596-2600
NANOMETER BIODEVICE FABRICATION BY ELECTRON-BEAM LITHOGRAPHY
Authors: DIFABRIZIO E GRELLA L BACIOCCHI M GENTILI M ASCOLI C CAPPELLA B FREDIANI C MORALES P
Citation: E. Difabrizio et al., NANOMETER BIODEVICE FABRICATION BY ELECTRON-BEAM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2892-2896
PROXIMITY CORRECTION FOR E-BEAM PATTERNED SUB-500NM DIFFRACTIVE OPTICAL-ELEMENTS
Authors: GRELLA L DIFABRIZIO E GENTILI M BACIOCCHI M MAGGIORA R
Citation: L. Grella et al., PROXIMITY CORRECTION FOR E-BEAM PATTERNED SUB-500NM DIFFRACTIVE OPTICAL-ELEMENTS, Microelectronic engineering, 35(1-4), 1997, pp. 495-498
A NOVEL X-RAY MASK CONCEPT FOR MIX-AND-MATCH LITHOGRAPHY FABRICATION OF MOS DEVICES BY SYNCHROTRON-RADIATION LITHOGRAPHY
Authors: DIFABRIZIO E GRELLA L GENTILI M BACIOCCHI M MASTROGIACOMO L CHOI SS JEON YJ YOO HJ CHUNG HB
Citation: E. Difabrizio et al., A NOVEL X-RAY MASK CONCEPT FOR MIX-AND-MATCH LITHOGRAPHY FABRICATION OF MOS DEVICES BY SYNCHROTRON-RADIATION LITHOGRAPHY, Microelectronic engineering, 35(1-4), 1997, pp. 553-556
FREESTANDING ZNSE ZNS QUANTUM WIRES WITH HIGH LUMINESCENCE EFFICIENCY/
Authors: RINALDI R TURCO C LOVERGINE N CINGOLANI R VASANELLI L DIFABRIZIO E GRELLA L GENTILI M DECARO L TAPFER L
Citation: R. Rinaldi et al., FREESTANDING ZNSE ZNS QUANTUM WIRES WITH HIGH LUMINESCENCE EFFICIENCY/, Applied physics letters, 71(26), 1997, pp. 3770-3772
FABRICATION OF HIGH-RESOLUTION FRESNEL ZONE PLATES BY A SINGLE-LAYER RESIST PROCESS
Authors: HIROSHIMA H KOMURO M GENTILI M GRELLA L DIFABRIZIO E MAGGIORA R
Citation: H. Hiroshima et al., FABRICATION OF HIGH-RESOLUTION FRESNEL ZONE PLATES BY A SINGLE-LAYER RESIST PROCESS, JPN J A P 1, 35(12B), 1996, pp. 6447-6451
ONE-STEP ELECTRON-BEAM LITHOGRAPHY FOR MULTIPURPOSE, DIFFRACTIVE OPTICAL-ELEMENTS WITH 200 NM RESOLUTION
Authors: DIFABRIZIO E GRELLA L BACIOCCHI M GENTILI M PESCHIAROLI D MASTROGIACOMO L MAGGIORA R
Citation: E. Difabrizio et al., ONE-STEP ELECTRON-BEAM LITHOGRAPHY FOR MULTIPURPOSE, DIFFRACTIVE OPTICAL-ELEMENTS WITH 200 NM RESOLUTION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3855-3859
APPLICATION OF A REACTION-DIFFUSION MODEL FOR NEGATIVE CHEMICALLY AMPLIFIED RESISTS TO DETERMINE ELECTRON-BEAM PROXIMITY CORRECTION PARAMETERS
Authors: GLEZOS N PATSIS GP RAPTIS I ARGITIS P GENTILI M GRELLA L
Citation: N. Glezos et al., APPLICATION OF A REACTION-DIFFUSION MODEL FOR NEGATIVE CHEMICALLY AMPLIFIED RESISTS TO DETERMINE ELECTRON-BEAM PROXIMITY CORRECTION PARAMETERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4252-4256
EXPOSURE LATITUDE AND CD CONTROL STUDY FOR ADDITIVELY PATTERNED X-RAYMASK WITH GBIT DRAM COMPLEXITY
Authors: BACIOCCHI M DIFABRIZIO E GENTILI M GRELLA L MAGGIORA L MASTROGIACOMO L PESCHIAROLI D CHOI S JEON YJ CHUNG HB YOO HJ
Citation: M. Baciocchi et al., EXPOSURE LATITUDE AND CD CONTROL STUDY FOR ADDITIVELY PATTERNED X-RAYMASK WITH GBIT DRAM COMPLEXITY, Microelectronic engineering, 30(1-4), 1996, pp. 195-198
DETERMINATION OF ACID DIFFUSION AND ENERGY DEPOSITION PARAMETERS BY POINT E-BEAM EXPOSURE IN CHEMICALLY AMPLIFIED RESISTS
Authors: RAPTIS I GRELLA L ARGITIS P GENTILI M GLEZOS N PETROCCO G
Citation: I. Raptis et al., DETERMINATION OF ACID DIFFUSION AND ENERGY DEPOSITION PARAMETERS BY POINT E-BEAM EXPOSURE IN CHEMICALLY AMPLIFIED RESISTS, Microelectronic engineering, 30(1-4), 1996, pp. 295-299
NANOFABRICATION OF FRESNEL ZONE PLATES FOR X-RAY FOCUSING
Authors: BACIOCCHI M DIFABRIZIO E GENTILI M GRELLA L MAGGIORA R MASTROGIACOMO L PESCHIAROLI D
Citation: M. Baciocchi et al., NANOFABRICATION OF FRESNEL ZONE PLATES FOR X-RAY FOCUSING, JPN J A P 1, 34(12B), 1995, pp. 6758-6763
HIGH-ACCURACY THICKNESS MEASUREMENTS BY MEANS OF BACKSCATTERING ELECTRON METROLOGY
Authors: BACIOCCHI M DIFABRIZIO E GENTILI M GRELLA L MAGGIORA R MASTROGIACOMO L PESCHIAROLI D
Citation: M. Baciocchi et al., HIGH-ACCURACY THICKNESS MEASUREMENTS BY MEANS OF BACKSCATTERING ELECTRON METROLOGY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2676-2681
NANOMETER METROLOGY BY MEANS OF BACKSCATTERED ELECTRONS
Authors: DIFABRIZIO E GRELLA L GENTILI M BACIOCCHI M MASTROGIACOMO L MAGGIORA R
Citation: E. Difabrizio et al., NANOMETER METROLOGY BY MEANS OF BACKSCATTERED ELECTRONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(2), 1995, pp. 321-326
DEVELOPMENT OF A FAST AND HIGH-RESOLUTION E-BEAM PROCESS FOR THE FABRICATION OF X-RAY MASKS WITH CD OF 0.15 MU-M
Authors: RAPTIS I GENTILI M DIFABRIZIO E MAGGIORA R BACIOCCHI M GRELLA L MASTROGIACOMO L
Citation: I. Raptis et al., DEVELOPMENT OF A FAST AND HIGH-RESOLUTION E-BEAM PROCESS FOR THE FABRICATION OF X-RAY MASKS WITH CD OF 0.15 MU-M, Microelectronic engineering, 27(1-4), 1995, pp. 417-420
DEVELOPMENT OF A HARD X-RAY-IMAGING MICROSCOPE
Authors: LAI B YUN W XIAO Y YANG L LEGNINI D CAI Z KRASNOPEROVA A CERRINA F DIFABRIZIO E GRELLA L GENTILI M
Citation: B. Lai et al., DEVELOPMENT OF A HARD X-RAY-IMAGING MICROSCOPE, Review of scientific instruments, 66(2), 1995, pp. 2287-2289
SECONDARY-ELECTRON LINE SCANS OVER HIGH-RESOLUTION RESIST IMAGES - THEORETICAL AND EXPERIMENTAL INVESTIGATION OF INDUCED LOCAL ELECTRICAL-FIELD EFFECTS
Authors: GRELLA L DIFABRIZIO E GENTILI M BACIOCCHI M MASTROGIACOMO L MAGGIORA R CAPODICCI L
Citation: L. Grella et al., SECONDARY-ELECTRON LINE SCANS OVER HIGH-RESOLUTION RESIST IMAGES - THEORETICAL AND EXPERIMENTAL INVESTIGATION OF INDUCED LOCAL ELECTRICAL-FIELD EFFECTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3555-3560
FABRICATION OF CONTROLLED SLOPE ATTENUATED PHASE-SHIFT X-RAY MASKS FOR 250 NM SYNCHROTRON LITHOGRAPHY
Authors: GENTILI M DIFABRIZIO E GRELLA L BACIOCCHI M MASTROGIACOMO L MAGGIORA R XIAO J CERRINA F
Citation: M. Gentili et al., FABRICATION OF CONTROLLED SLOPE ATTENUATED PHASE-SHIFT X-RAY MASKS FOR 250 NM SYNCHROTRON LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3954-3958
HIGH-PERFORMANCE MULTILEVEL BLAZED X-RAY MICROSCOPY FRESNEL ZONE PLATES - FABRICATED USING X-RAY-LITHOGRAPHY
Authors: DIFABRIZIO E GENTILI M GRELLA L BACIOCCHI M KRASNOPEROVA A CERRINA F YUN W LAI B GLUSKIN E
Citation: E. Difabrizio et al., HIGH-PERFORMANCE MULTILEVEL BLAZED X-RAY MICROSCOPY FRESNEL ZONE PLATES - FABRICATED USING X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3979-3985
INTRAVENOUS LEIOMYOMATOSIS
Authors: GRELLA L ARNOLD TE KVILEKVAL KHV GIRON F
Citation: L. Grella et al., INTRAVENOUS LEIOMYOMATOSIS, Journal of vascular surgery, 20(6), 1994, pp. 987-994
STM CHARACTERIZATION OF INP GRATINGS FOR DFB LASER FABRICATION
Authors: MENEGHINI G PICOTTO GB GENTILI M GRELLA L
Citation: G. Meneghini et al., STM CHARACTERIZATION OF INP GRATINGS FOR DFB LASER FABRICATION, Surface and interface analysis, 22(1-12), 1994, pp. 296-299
METROLOGY OF HIGH-RESOLUTION RESIST STRUCTURES ON INSULATING SUBSTRATES
Authors: DIFABRIZIO E GRELLA L LUCIANI L GENTILI M BACIOCCHI M FIGLIOMENI M MASTROGIACOMO L MAGGIORA R LEONARD Q CERRINA F MOLINO M POWDERLY D
Citation: E. Difabrizio et al., METROLOGY OF HIGH-RESOLUTION RESIST STRUCTURES ON INSULATING SUBSTRATES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2456-2462
Risultati: 1-25 | 26-29