Authors: Mkrtchyan, M Gallatin, G Liddle, A Zhu, XQ Munro, E Waskiewicz, W Muller, D

Citation: M. Mkrtchyan et al., Mask-membrane impact on image blur in SCALPEL, MICROEL ENG, 57-8, 2001, pp. 277-284

Authors: Chodos, A Gallatin, G

Citation: A. Chodos et G. Gallatin, Generalized Goldstone theorem: Automatic imposition of the Higgs mechanismand application to scale and conformal symmetry breaking, J MATH PHYS, 42(8), 2001, pp. 3282-3291

Authors: Fares, N Stanton, S Liddle, J Gallatin, G

Citation: N. Fares et al., Analytical-based solutions for SCALPEL wafer heating, J VAC SCI B, 18(6), 2000, pp. 3115-3121

Authors: Gianoulakis, S Liddle, J Stanton, S Gallatin, G

Citation: S. Gianoulakis et al., Thermal distortion predictions of a silicon wafer during exposure in a scalpel tool, MICROEL ENG, 53(1-4), 2000, pp. 357-360

Authors: Farrow, RC Waskiewicz, WK Kizilyalli, I Ocola, L Felker, J Biddick, C Gallatin, G Mkrtchyan, M Blakey, M Kraus, J Novembre, A Orphanos, P Peabody, M Kasica, R Kornblit, A Klemens, F

Citation: Rc. Farrow et al., CMOS compatible alignment marks for the SCALPEL proof of lithography tool, MICROEL ENG, 46(1-4), 1999, pp. 263-266