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1-12
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Results: 12
Authors:
Sarangi, D
Godon, C
Granier, A
Moalic, R
Goullet, A
Turban, G
Chauvet, O
Citation: D. Sarangi et al., Carbon nanotubes and nanostructures grown from diamond-like carbon and polyethylene, APPL PHYS A, 73(6), 2001, pp. 765-768
Authors:
Benissad, N
Aumaille, K
Granier, A
Goullet, A
Citation: N. Benissad et al., Structure and properties of silicon oxide films deposited in a dual microwave-rf plasma reactor, THIN SOL FI, 384(2), 2001, pp. 230-235
Authors:
Hong, JG
Granier, A
Goullet, A
Turban, G
Citation: Jg. Hong et al., In situ deposition and etching process of a-C : H : N films in a dual electron cyclotron resonance-radio frequency plasma, DIAM RELAT, 9(3-6), 2000, pp. 573-576
Authors:
Vallee, C
Rhallabi, A
Granier, A
Goullet, A
Turban, G
Citation: C. Vallee et al., Estimation of the TEOS dissociation coefficient by electron impact, J VAC SCI A, 18(6), 2000, pp. 2728-2732
Authors:
Goullet, A
Vallee, C
Granier, A
Turban, G
Citation: A. Goullet et al., Optical spectroscopic analyses of OH incorporation into SiO2 films deposited from O-2/tetraethoxysilane plasmas, J VAC SCI A, 18(5), 2000, pp. 2452-2458
Authors:
Hong, JG
Goullet, A
Turban, G
Citation: Jg. Hong et al., Optical characterization of hydrogenated amorphous carbon (a-C : H) thin films deposited from methane plasma, THIN SOL FI, 364(1-2), 2000, pp. 144-149
Authors:
Aumaille, K
Vallee, C
Granier, A
Goullet, A
Gaboriau, F
Turban, G
Citation: K. Aumaille et al., A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor, THIN SOL FI, 359(2), 2000, pp. 188-196
Authors:
Vallee, C
Goullet, A
Granier, A
van der Lee, A
Durand, J
Marliere, C
Citation: C. Vallee et al., Inorganic to organic crossover in thin films deposited from O-2/TEOS plasmas, J NON-CRYST, 272(2-3), 2000, pp. 163-173
Authors:
Granier, A
Vallee, C
Goullet, A
Aumaille, K
Turban, G
Citation: A. Granier et al., Experimental investigation of the respective roles of oxygen atoms and electrons in the deposition of SiO2 in O-2/TEOS helicon plasmas, J VAC SCI A, 17(5), 1999, pp. 2470-2474
Authors:
Benissad, N
Boisse-Laporte, C
Vallee, C
Granier, A
Goullet, A
Citation: N. Benissad et al., Silicon dioxide deposition in a microwave plasma reactor, SURF COAT, 119, 1999, pp. 868-873
Authors:
Vallee, C
Granier, A
Aumaille, K
Cardinaud, C
Goullet, A
Coulon, N
Turban, G
Citation: C. Vallee et al., Chemical etching of thin SiOxCyHz films by post-deposition exposure to oxygen plasma, APPL SURF S, 139, 1999, pp. 57-61
Authors:
Hong, J
Goullet, A
Turban, G
Citation: J. Hong et al., Ellipsometry and Raman study on hydrogenated amorphous carbon (a-C : H) films deposited in a dual ECR-r.f. plasma, THIN SOL FI, 352(1-2), 1999, pp. 41-48
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