Authors:
Pfeiffer, HC
Dhaliwal, RS
Golladay, SD
Doran, SK
Gordon, MS
Groves, TR
Kendall, RA
Lieberman, JE
Petric, PF
Pinckney, DJ
Quickle, RJ
Robinson, CF
Rockrohr, JD
Senesi, JJ
Stickel, W
Tressler, EV
Tanimoto, A
Yamaguchi, T
Okamoto, K
Suzuki, K
Okino, T
Kawata, S
Morita, K
Suziki, SC
Shimizu, H
Kojima, S
Varnell, G
Novak, WT
Stumbo, DP
Sogard, M
Citation: Hc. Pfeiffer et al., Projection reduction exposure with variable axis immersion lenses: Next generation lithography, J VAC SCI B, 17(6), 1999, pp. 2840-2846
Citation: Jg. Hartley et Tr. Groves, Chrome on glass mask writing at 75 kV with the IBM EL4+electron-beam system, J VAC SCI B, 17(6), 1999, pp. 2932-2935
Authors:
Sturans, MA
Hartley, JG
Pfeiffer, HC
Dhaliwal, RS
Groves, TR
Pavick, JW
Quickle, RJ
Clement, CS
Dick, GJ
Enichen, WA
Gordon, MS
Kendall, RA
Kostek, CA
Pinckney, DJ
Robinson, CF
Rockrohr, JD
Safran, JM
Senesi, JJ
Tressler, EV
Citation: Ma. Sturans et al., EL5: One tool for advanced x-ray and chrome on glass mask making, J VAC SCI B, 16(6), 1998, pp. 3164-3167
Citation: Tr. Groves et Ra. Kendall, Distributed, multiple variable shaped electron beam column for high throughput maskless lithography, J VAC SCI B, 16(6), 1998, pp. 3168-3173