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Results: 1-23 |
Results: 23
ELECTRON-OPTICS METHOD FOR HIGH-THROUGHPUT IN A SCALPEL SYSTEM - PRELIMINARY-ANALYSIS
Authors: WASKIEWICZ WK HARRIOTT LR LIDDLE JA STANTON ST BERGER SD MUNRO E ZHU X
Citation: Wk. Waskiewicz et al., ELECTRON-OPTICS METHOD FOR HIGH-THROUGHPUT IN A SCALPEL SYSTEM - PRELIMINARY-ANALYSIS, Microelectronic engineering, 42, 1998, pp. 215-218
SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY FOR SUBOPTICAL LITHOGRAPHY
Authors: HARRIOTT LR
Citation: Lr. Harriott, SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY FOR SUBOPTICAL LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2130-2135
THE SCALPEL PROOF-OF-CONCEPT SYSTEM
Authors: HARRIOTT LR BERGER SD BIDDICK C BLAKEY MI BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J DEMARCO R FARROW RC FELKER JA FETTER L FREEMAN R HOPKINS L HUGGINS HA KNUREK CS KRAUS JS LIDDLE JA MKRTYCHAN M NOVEMBRE AE PEABODY ML TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WERDER KS WINDT D
Citation: Lr. Harriott et al., THE SCALPEL PROOF-OF-CONCEPT SYSTEM, Microelectronic engineering, 35(1-4), 1997, pp. 477-480
PRELIMINARY-RESULTS FROM A PROTOTYPE PROJECTION ELECTRON-BEAM STEPPER-SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY PROOF-OF-CONCEPT SYSTEM
Authors: HARRIOTT LR BERGER SD BIDDICK C BLAKEY MI BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J DIMARCO R FARROW RC FELKER JA FETTER L FREEMAN R HOPKINS L HUGGINS HA KNUREK CS KRAUS JS LIDDLE JA MKRTYCHAN M NOVEMBRE AE PEABODY ML TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WERDER KS WINDT D
Citation: Lr. Harriott et al., PRELIMINARY-RESULTS FROM A PROTOTYPE PROJECTION ELECTRON-BEAM STEPPER-SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY PROOF-OF-CONCEPT SYSTEM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3825-3828
THE SCATTERING WITH ANGULAR LIMITATION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL) SYSTEM
Authors: LIDDLE JA BERGER SD BIDDICK CJ BLAKEY MI BOLAN KJ BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J FARROW RC FELKER JA FETTER LA FREEMAN B HARRIOTT LR HOPKINS L HUGGINS HA KNUREK CS KRAUS JS MIXON DA MKRTCHYAN MM NOVEMBRE AE PEABODY ML SIMPSON WM TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WILLIAMS JK WINDT DL
Citation: Ja. Liddle et al., THE SCATTERING WITH ANGULAR LIMITATION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL) SYSTEM, JPN J A P 1, 34(12B), 1995, pp. 6663-6671
SPACE-CHARGE EFFECTS IN PROJECTION CHARGED-PARTICLE LITHOGRAPHY SYSTEMS
Authors: HARRIOTT LR BERGER SD LIDDLE JA WATSON GP MKRTCHYAN MM
Citation: Lr. Harriott et al., SPACE-CHARGE EFFECTS IN PROJECTION CHARGED-PARTICLE LITHOGRAPHY SYSTEMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2404-2408
POLYCRYSTALLINE TUNGSTEN AND IRIDIUM PROBE TIP PREPARATION WITH A GA-BEAM( FOCUSED ION)
Authors: HOPKINS LC GRIFFITH JE HARRIOTT LR VASILE MJ
Citation: Lc. Hopkins et al., POLYCRYSTALLINE TUNGSTEN AND IRIDIUM PROBE TIP PREPARATION WITH A GA-BEAM( FOCUSED ION), Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(2), 1995, pp. 335-337
KINETIC ROUGHNESS IN EPITAXY (EXPERIMENTAL)
Authors: COTTA MA HAMM RA CHU SNG HULL R HARRIOTT LR TEMKIN H
Citation: Ma. Cotta et al., KINETIC ROUGHNESS IN EPITAXY (EXPERIMENTAL), Materials science & engineering. B, Solid-state materials for advanced technology, 30(2-3), 1995, pp. 137-142
STOCHASTIC SCATTERING IN CHARGED-PARTICLE PROJECTION SYSTEMS - A NEAREST-NEIGHBOR APPROACH
Authors: MKRTCHYAN MM LIDDLE JA BERGER SD HARRIOTT LR GIBSON JM SCHWARTZ AM
Citation: Mm. Mkrtchyan et al., STOCHASTIC SCATTERING IN CHARGED-PARTICLE PROJECTION SYSTEMS - A NEAREST-NEIGHBOR APPROACH, Journal of applied physics, 78(12), 1995, pp. 6888-6902
ON THE ORIGIN OF OVAL DEFECTS IN METALORGANIC MOLECULAR-BEAM EPITAXY OF INP
Authors: COTTA MA HAMM RA CHU SNG HARRIOTT LR TEMKIN H
Citation: Ma. Cotta et al., ON THE ORIGIN OF OVAL DEFECTS IN METALORGANIC MOLECULAR-BEAM EPITAXY OF INP, Applied physics letters, 66(18), 1995, pp. 2358-2360
FOCUSED-ION-BEAM-INDUCED GAS ETCHING
Authors: HARRIOTT LR
Citation: Lr. Harriott, FOCUSED-ION-BEAM-INDUCED GAS ETCHING, JPN J A P 1, 33(12B), 1994, pp. 7094-7098
AN ANALYTICAL MODEL OF STOCHASTIC INTERACTION EFFECTS IN PROJECTION SYSTEMS USING A NEAREST-NEIGHBOR APPROACH
Authors: MKRTCHYAN MM LIDDLE JA BERGER SD HARRIOTT LR SCHWARTZ AM GIBSON JM
Citation: Mm. Mkrtchyan et al., AN ANALYTICAL MODEL OF STOCHASTIC INTERACTION EFFECTS IN PROJECTION SYSTEMS USING A NEAREST-NEIGHBOR APPROACH, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3508-3512
NOVEL ELECTROSTATIC COLUMN FOR ION PROJECTION LITHOGRAPHY
Authors: CHALUPKA A STENGL G BUSCHBECK H LAMMER G VONACH H FISCHER R HAMMEL E LOSCHNER H NOWAK R WOLF P FINKELSTEIN W HILL RW BERRY IL HARRIOTT LR MELNGAILIS J RANDALL JN WOLFE JC STROH H WOLLNIK H MONDELLI AA PETILLO JJ LEUNG K
Citation: A. Chalupka et al., NOVEL ELECTROSTATIC COLUMN FOR ION PROJECTION LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3513-3517
EXPERIMENTAL INVESTIGATION OF STOCHASTIC SPACE-CHARGE EFFECTS ON PATTERN RESOLUTION IN ION PROJECTION LITHOGRAPHY SYSTEMS
Authors: HAMMEL E CHALUPKA A FEGERL J FISCHER R LAMMER G LOSCHNER H MALEK L NOWAK R STENGL G VONACH H WOLF P BRUNGER WH BUCHMANN LM TORKLER M CEKAN E FALLMANN W PASCHKE F STANGL G THALINGER F BERRY IL HARRIOTT LR FINKELSTEIN W HILL RW
Citation: E. Hammel et al., EXPERIMENTAL INVESTIGATION OF STOCHASTIC SPACE-CHARGE EFFECTS ON PATTERN RESOLUTION IN ION PROJECTION LITHOGRAPHY SYSTEMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3533-3538
MULTICHAMBER PROCESSING FOR OPTOELECTRONICS
Authors: HARRIOTT LR COTTA MA TEMKIN H HAMM RA FEYGENSON A RITTER D WANG YL
Citation: Lr. Harriott et al., MULTICHAMBER PROCESSING FOR OPTOELECTRONICS, Microelectronic engineering, 25(2-4), 1994, pp. 255-264
INGAAS INP QUANTUM-WELLS WITH PERIODIC THICKNESS VARIATION/
Authors: BERNUSSI AA BRASIL MJSP BRUM JA COTTA MA HAMM RA STALEY TW CHU SNG HARRIOTT LR PANISH MB TEMKIN H
Citation: Aa. Bernussi et al., INGAAS INP QUANTUM-WELLS WITH PERIODIC THICKNESS VARIATION/, Solid-state electronics, 37(4-6), 1994, pp. 653-656
LATERAL THICKNESS MODULATION OF INGAAS INP QUANTUM-WELLS GROWN BY METALORGANIC MOLECULAR-BEAM EPITAXY/
Authors: COTTA MA HAMM RA CHU SNG HARRIOTT LR TEMKIN H
Citation: Ma. Cotta et al., LATERAL THICKNESS MODULATION OF INGAAS INP QUANTUM-WELLS GROWN BY METALORGANIC MOLECULAR-BEAM EPITAXY/, Journal of applied physics, 75(1), 1994, pp. 630-632
INGAAS INP QUANTUM-WELLS WITH THICKNESS MODULATION/
Authors: BRASIL MJSP BERNUSSI AA COTTA MA MARQUEZINI MV BRUM JA HAMM RA CHU SNG HARRIOTT LR TEMKIN H
Citation: Mjsp. Brasil et al., INGAAS INP QUANTUM-WELLS WITH THICKNESS MODULATION/, Applied physics letters, 65(7), 1994, pp. 857-859
DIGITAL SCAN MODEL FOR FOCUSED ION-BEAM-INDUCED GAS ETCHING
Authors: HARRIOTT LR
Citation: Lr. Harriott, DIGITAL SCAN MODEL FOR FOCUSED ION-BEAM-INDUCED GAS ETCHING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2012-2015
FOCUSED ION-BEAM XEF2 ETCHING OF MATERIALS FOR PHASE-SHIFT MASKS
Authors: HARRIOTT LR
Citation: Lr. Harriott, FOCUSED ION-BEAM XEF2 ETCHING OF MATERIALS FOR PHASE-SHIFT MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2200-2203
KINETIC SURFACE ROUGHENING IN MOLECULAR-BEAM EPITAXY OF INP
Authors: COTTA MA HAMM RA STALEY TW CHU SNG HARRIOTT LR PANISH MB TEMKIN H
Citation: Ma. Cotta et al., KINETIC SURFACE ROUGHENING IN MOLECULAR-BEAM EPITAXY OF INP, Physical review letters, 70(26), 1993, pp. 4106-4109
DRY LITHOGRAPHY USING FOCUSED ION-BEAM IMPLANTATION AND REACTIVE ION ETCHING OF SIO2
Authors: CHOQUETTE KD HARRIOTT LR
Citation: Kd. Choquette et Lr. Harriott, DRY LITHOGRAPHY USING FOCUSED ION-BEAM IMPLANTATION AND REACTIVE ION ETCHING OF SIO2, Applied physics letters, 62(25), 1993, pp. 3294-3296
MASK TECHNOLOGIES FOR SOFT-X-RAY PROJECTION LITHOGRAPHY AT 13 NM
Authors: TENNANT DM FETTER LA HARRIOTT LR MACDOWELL AA MULGREW PP PASTALAN JZ WASKIEWICZ WK WINDT DL WOOD OR
Citation: Dm. Tennant et al., MASK TECHNOLOGIES FOR SOFT-X-RAY PROJECTION LITHOGRAPHY AT 13 NM, Applied optics, 32(34), 1993, pp. 7007-7011
Risultati: 1-23 |