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Results: 1-25/32
Authors:
BORGES CFM
PFENDER E
HEBERLEIN J
ANDERSON CVDR
Citation: Cfm. Borges et al., ADHESION IMPROVEMENT OF DIAMOND FILMS ON MOLYBDENUM ROD SUBSTRATES USING METALLIC POWDER, DIAMOND AND RELATED MATERIALS, 7(9), 1998, pp. 1351-1356
Authors:
KOLMAN D
HEBERLEIN J
PFENDER E
Citation: D. Kolman et al., INFLUENCE OF DEPOSITION PARAMETERS ON DIAMOND THERMAL PLASMA CHEMICAL-VAPOR-DEPOSITION WITH LIQUID FEEDSTOCK INJECTION, DIAMOND AND RELATED MATERIALS, 7(6), 1998, pp. 794-801
Authors:
BORGES CFM
ASMANN M
PFENDER E
HEBERLEIN J
Citation: Cfm. Borges et al., DIAMOND DEPOSITION ON SUBSTRATES WITH DIFFERENT GEOMETRIES IN A THERMAL PLASMA REACTOR, Plasma chemistry and plasma processing, 18(2), 1998, pp. 305-324
Authors:
KOLMAN D
HEBERLEIN J
PFENDER E
Citation: D. Kolman et al., A 3-DIMENSIONAL 2-PHASE MODEL FOR THERMAL PLASMA CHEMICAL-VAPOR-DEPOSITION WITH LIQUID FEEDSTOCK INJECTION, Plasma chemistry and plasma processing, 18(1), 1998, pp. 73-89
Authors:
POSTEL O
HEBERLEIN J
Citation: O. Postel et J. Heberlein, DEPOSITION OF BORON-CARBIDE THIN-FILM BY SUPERSONIC PLASMA-JET CVD WITH SECONDARY DISCHARGE, Surface & coatings technology, 109(1-3), 1998, pp. 247-252
Authors:
WATANABE T
WANG X
PFENDER E
HEBERLEIN J
Citation: T. Watanabe et al., CORRELATIONS BETWEEN ELECTRODE PHENOMENA AND COATING PROPERTIES IN WIRE ARC SPRAYING, Thin solid films, 316(1-2), 1998, pp. 169-173
Authors:
CHEN HC
PFENDER E
HEBERLEIN J
Citation: Hc. Chen et al., PLASMA-SPRAYED ZRO2 THERMAL BARRIER COATINGS DOPED WITH AN APPROPRIATE AMOUNT OF SIO2, Thin solid films, 315(1-2), 1998, pp. 159-169
Authors:
AMAKAWA T
JENISTA J
HEBERLEIN J
PFENDER E
Citation: T. Amakawa et al., ANODE-BOUNDARY-LAYER BEHAVIOR IN A TRANSFERRED, HIGH-INTENSITY ARC, Journal of physics. D, Applied physics (Print), 31(20), 1998, pp. 2826-2834
Authors:
ZHOU X
HEBERLEIN J
Citation: X. Zhou et J. Heberlein, AN EXPERIMENTAL INVESTIGATION OF FACTORS AFFECTING ARC-CATHODE EROSION, Journal of physics. D, Applied physics (Print), 31(19), 1998, pp. 2577-2590
Authors:
RAO NP
TYMIAK N
BLUM J
NEUMAN A
LEE HJ
GIRSHICK SL
MCMURRY PH
HEBERLEIN J
Citation: Np. Rao et al., HYPERSONIC PLASMA PARTICLE DEPOSITION OF NANOSTRUCTURED SILICON AND SILICON-CARBIDE, Journal of aerosol science, 29(5-6), 1998, pp. 707-720
Authors:
CHEN HC
PFENDER E
HEBERLEIN J
Citation: Hc. Chen et al., IMPROVEMENT OF PLASMA SPRAYING EFFICIENCY AND COATING QUALITY, Plasma chemistry and plasma processing, 17(1), 1997, pp. 93-105
Authors:
CHEN HC
HEBERLEIN J
PFENDER E
Citation: Hc. Chen et al., TEM CHARACTERIZATION OF PLASMA-SPRAYED THERMAL BARRIER COATINGS AND CERAMIC-METAL INTERFACES AFTER HOT ISOSTATIC PRESSING, Thin solid films, 301(1-2), 1997, pp. 105-114
Authors:
CHEN HC
PFENDER E
HEBERLEIN J
Citation: Hc. Chen et al., STRUCTURAL-CHANGES IN PLASMA-SPRAYED ZRO2 COATINGS AFTER HOT ISOSTATIC PRESSING, Thin solid films, 293(1-2), 1997, pp. 227-235
Authors:
BAHR DF
BUCCI DV
SCHADLER LS
LAST JA
HEBERLEIN J
PFENDER E
GERBERICH WW
Citation: Df. Bahr et al., CHARACTERIZATION OF DCJET CVD DIAMOND FILMS ON MOLYBDENUM, DIAMOND AND RELATED MATERIALS, 5(12), 1996, pp. 1462-1472
Authors:
CHEN WLT
HEBERLEIN J
PFENDER E
Citation: Wlt. Chen et al., CRITICAL ANALYSIS OF VISCOSITY DATA OF THERMAL ARGON PLASMAS AT ATMOSPHERIC-PRESSURE, Plasma chemistry and plasma processing, 16(4), 1996, pp. 635-650
Authors:
HEBERLEIN J
KONG PC
YOUNG RM
VERPREK S
Citation: J. Heberlein et al., SPECIAL ISSUE IN HONOR OF PFENDER,EMIL ON THE OCCASION OF HIS 70TH BIRTHDAY - FOREWORD, Plasma chemistry and plasma processing, 16(1), 1996, pp. 3-4
Authors:
GEORGE C
CANDLER G
YOUNG R
PFENDER E
HEBERLEIN J
Citation: C. George et al., NOZZLE OPTIMIZATION FOR DISSOCIATED SPECIES TRANSPORT IN LOW-PRESSUREPLASMA CHEMICAL-VAPOR-DEPOSITION, Plasma chemistry and plasma processing, 16(1), 1996, pp. 43-56
Authors:
KOLMAN D
HEBERLEIN J
PFENDER E
YOUNG R
Citation: D. Kolman et al., 2-DIMENSIONAL MODEL FOR THERMAL PLASMA CHEMICAL-VAPOR-DEPOSITION, Plasma chemistry and plasma processing, 16(1), 1996, pp. 57-69
Authors:
ZHOU X
HEBERLEIN J
Citation: X. Zhou et J. Heberlein, CHARACTERIZATION OF THE ARC CATHODE ATTACHMENT BY EMISSION-SPECTROSCOPY AND COMPARISON TO THEORETICAL PREDICTIONS, Plasma chemistry and plasma processing, 16(1), 1996, pp. 229-244
Authors:
MENART J
HEBERLEIN J
PFENDER E
Citation: J. Menart et al., THEORETICAL RADIATIVE EMISSION RESULTS FOR ARGON COPPER THERMAL PLASMAS/, Plasma chemistry and plasma processing, 16(1), 1996, pp. 245-265
Authors:
MENART J
HEBERLEIN J
PFENDER E
Citation: J. Menart et al., LINE-BY-LINE METHOD OF CALCULATING EMISSION COEFFICIENTS FOR THERMAL PLASMAS CONSISTING OF MONATOMIC SPECIES, Journal of quantitative spectroscopy & radiative transfer, 56(3), 1996, pp. 377-398
SYNTHESIS OF NANOPHASE SILICON, CARBON, AND SILICON-CARBIDE POWDERS USING A PLASMA EXPANSION PROCESS
Authors:
RAO N
MICHEEL B
HANSEN D
FANDREY C
BENCH M
GIRSHICK S
HEBERLEIN J
MCMURRY P
Citation: N. Rao et al., SYNTHESIS OF NANOPHASE SILICON, CARBON, AND SILICON-CARBIDE POWDERS USING A PLASMA EXPANSION PROCESS, Journal of materials research, 10(8), 1995, pp. 2073-2084
Authors:
RAO N
GIRSHICK S
HEBERLEIN J
MCMURRY P
JONES S
HANSEN D
MICHEEL B
Citation: N. Rao et al., NANOPARTICLE FORMATION USING A PLASMA EXPANSION PROCESS, Plasma chemistry and plasma processing, 15(4), 1995, pp. 581-606
Authors:
CHEN WLT
HEBERLEIN J
PFENDER E
PATEYRON B
DELLUC G
ELCHINGER MF
FAUCHAIS P
Citation: Wlt. Chen et al., THERMODYNAMIC AND TRANSPORT-PROPERTIES OF ARGON HELIUM PLASMAS AT ATMOSPHERIC-PRESSURE, Plasma chemistry and plasma processing, 15(3), 1995, pp. 559-579
Authors:
HUANG PC
HEBERLEIN J
PFENDER E
Citation: Pc. Huang et al., A 2-FLUID MODEL OF TURBULENCE FOR A THERMAL PLASMA-JET, Plasma chemistry and plasma processing, 15(1), 1995, pp. 25-46