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Citation: Sm. Kim et al., Optimization of dipole off-axis illumination by 1st-order efficiency method for sub-120 nm node with KrF lithography, JPN J A P 1, 39(12B), 2000, pp. 6777-6780

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Citation: Ym. Ham et al., Application of a new empirical model to the electron beam lithography process with chemically amplified resists, JPN J A P 1, 37(12B), 1998, pp. 6761-6766

Authors: Ham, YM Lee, WG Chun, K Chung, TD

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