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Citation: Am. Wrobel et al., Oligomerization and polymerization steps in remote plasma chemical vapor deposition of silicon-carbon and silica films from organosilicon sources, CHEM MATER, 13(5), 2001, pp. 1884-1895
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Citation: M. Niraula et al., Shallow junction formation on p-like CdTe crystals by indium diffusion using excimer laser annealing, J ELEC MAT, 30(8), 2001, pp. 911-916
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Citation: G. Shimaoka et al., Structure and optical properties of (001)GaAs surfaces nitrided in plasma-assisted NH3 gas, APPL SURF S, 175, 2001, pp. 436-441
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Citation: M. Nakamura et al., Characterization of TiOx film prepared by plasma enhanced chemical vapor deposition using a multi-jet hollow cathode plasma source, APPL SURF S, 175, 2001, pp. 697-702