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Results: 1-13 |
Results: 13
Comparison of plasma chemistries and structure-property relationships of fluorocarbon films deposited from octafluorocyclobutane and pentafluoroethane monomers
Authors: Agraharam, S Hess, DW Kohl, PA Allen, SAB
Citation: S. Agraharam et al., Comparison of plasma chemistries and structure-property relationships of fluorocarbon films deposited from octafluorocyclobutane and pentafluoroethane monomers, J VAC SCI B, 19(2), 2001, pp. 439-446
Enhancement of isopropanol-based photoresist removal by the addition of aqueous alkaline solutions
Authors: Kamal, T Hess, DW
Citation: T. Kamal et Dw. Hess, Enhancement of isopropanol-based photoresist removal by the addition of aqueous alkaline solutions, J VAC SCI B, 19(2), 2001, pp. 461-466
Antiferromagnetic domains and superconductivity in UPt3 - art. no. 134502
Authors: Graf, MJ Hess, DW
Citation: Mj. Graf et Dw. Hess, Antiferromagnetic domains and superconductivity in UPt3 - art. no. 134502, PHYS REV B, 6313(13), 2001, pp. 4502
A Bergman cyclization approach to polymers for thin-film lithography
Authors: Chen, XH Tolbert, LM Hess, DW Henderson, C
Citation: Xh. Chen et al., A Bergman cyclization approach to polymers for thin-film lithography, MACROMOLEC, 34(12), 2001, pp. 4104-4108
Electrical properties and temperature-humidity studies of fluorocarbon films deposited from pentafluoroethane/argon plasmas
Authors: Agraharam, S Hess, DW Kohl, PA Allen, SAB
Citation: S. Agraharam et al., Electrical properties and temperature-humidity studies of fluorocarbon films deposited from pentafluoroethane/argon plasmas, J ELCHEM SO, 148(5), 2001, pp. F102-F107
A novel method of etching copper oxide using acetic acid
Authors: Chavez, KL Hess, DW
Citation: Kl. Chavez et Dw. Hess, A novel method of etching copper oxide using acetic acid, J ELCHEM SO, 148(11), 2001, pp. G640-G643
Amorphous hydrogenated carbon film formation from benzene by electron cyclotron resonance chemical vapor deposition
Authors: Chen, XH Ning, ZY Hess, DW Tolbert, LM
Citation: Xh. Chen et al., Amorphous hydrogenated carbon film formation from benzene by electron cyclotron resonance chemical vapor deposition, J VAC SCI A, 18(1), 2000, pp. 68-73
Thermal stability of fluorocarbon films deposited from pentafluoroethane/argon plasmas
Authors: Agraharam, S Hess, DW Kohl, PA Allen, SAB
Citation: S. Agraharam et al., Thermal stability of fluorocarbon films deposited from pentafluoroethane/argon plasmas, J ELCHEM SO, 147(7), 2000, pp. 2665-2670
Photoresist removal using low molecular weight alcohols
Authors: Kamal, T Hess, DW
Citation: T. Kamal et Dw. Hess, Photoresist removal using low molecular weight alcohols, J ELCHEM SO, 147(7), 2000, pp. 2749-2753
Predictors for return to work after spinal cord injury: A 3-year multicenter analysis
Authors: Hess, DW Ripley, DL McKinley, WO Tewksbury, M
Citation: Dw. Hess et al., Predictors for return to work after spinal cord injury: A 3-year multicenter analysis, ARCH PHYS M, 81(3), 2000, pp. 359-363
Plasma chemistry in fluorocarbon film deposition from pentafluoroethane/argon mixtures
Authors: Agraharam, S Hess, DW Kohl, PA Allen, SAB
Citation: S. Agraharam et al., Plasma chemistry in fluorocarbon film deposition from pentafluoroethane/argon mixtures, J VAC SCI A, 17(6), 1999, pp. 3265-3271
Quasiparticle band structure and density-functional theory: Single-particle excitations and band gaps in lattice models
Authors: Hess, DW Serene, JW
Citation: Dw. Hess et Jw. Serene, Quasiparticle band structure and density-functional theory: Single-particle excitations and band gaps in lattice models, PHYS REV B, 59(24), 1999, pp. 15617-15624
Plasma assisted oxidation, anodization, and nitridation of silicon
Authors: Hess, DW
Citation: Dw. Hess, Plasma assisted oxidation, anodization, and nitridation of silicon, IBM J RES, 43(1-2), 1999, pp. 127-145
Risultati: 1-13 |