AAAAAA
Results:
1-14
|
Results: 14
Authors:
MOTAI K
ITOGA T
IRIE T
Citation: K. Motai et al., THE EFFECT OF ISOPROPYL-ALCOHOL ADSORPTION ON THE ELECTRICAL CHARACTERISTICS OF THIN OXIDE, JPN J A P 1, 37(3B), 1998, pp. 1137-1139
Authors:
ITOGA T
KOJIMA H
HIRAIWA A
OHKURA M
Citation: T. Itoga et al., DEGRADATION OF N(+) P JUNCTION CHARACTERISTICS BY ALUMINUM CONTAMINATION/, JPN J A P 1, 36(7A), 1997, pp. 4431-4434
Authors:
ITOGA T
KOJIMA H
YUGAMI J
OHKURA M
Citation: T. Itoga et al., THE INCREASE OF THE NATIVE-OXIDE THICKNESS ON H-TERMINATED SI SURFACES BY GASEOUS CONTAMINATION IN A CLEAN ROOM ATMOSPHERE, JPN J A P 1, 36(3B), 1997, pp. 1578-1581
Authors:
YANO F
ITOGA T
KANEHORI K
Citation: F. Yano et al., X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF NATIVE OXIDATION ON MISORIENTED SI(100), JPN J A P 2, 36(6A), 1997, pp. 670-672
Authors:
TORII K
KAWAKAMI H
MIKI H
KUSHIDA K
ITOGA T
GOTO Y
KUMIHASHI T
YOKOYAMA N
MONIWA M
SHOJI K
KAGA T
FUJISAKI Y
Citation: K. Torii et al., PROCESS AND PROPERTIES OF PT PB(ZR,TI)O-3/PT INTEGRATED FERROELECTRICCAPACITORS/, Integrated ferroelectrics, 16(1-4), 1997, pp. 21-28
Authors:
ITOGA T
ITOH M
TAKAFUJI Y
Citation: T. Itoga et al., LOW-TEMPERATURE POLY-SI TFT-LCD, Sharp giho, (69), 1997, pp. 64-68
Authors:
MATSUBARA A
KOJIMA H
ITOGA T
KANEHORI K
Citation: A. Matsubara et al., A CERAMIC PLASMA TORCH FOR DETERMINING SILICON CONTENT IN HF SOLUTIONS BY INDUCTIVELY-COUPLED PLASMA-ATOMIC EMISSION-SPECTROMETRY, JPN J A P 1, 35(8), 1996, pp. 4541-4544
Authors:
YANO F
HIRAOKA A
ITOGA T
MATSUBARA A
KOJIMA H
KANEHORI K
MITSUI Y
Citation: F. Yano et al., X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY ON NATIVE OXIDATION OF AS-IMPLANTED SI (100), Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2707-2711
Authors:
YANO F
HIRAOKA A
ITOGA T
KOJIMA H
KANEHORI K
MITSUI Y
Citation: F. Yano et al., INFLUENCE OF ION-IMPLANTATION ON NATIVE OXIDATION OF SI IN A CLEAN-ROOM ATMOSPHERE, Applied surface science, 101, 1996, pp. 138-142
Authors:
MATSUBARA A
KOJIMA H
ITOGA T
KANEHORI K
Citation: A. Matsubara et al., ULTRA-SHALLOW DEPTH PROFILING OF ARSENIC IMPLANTS IN SILICON BY HYDRIDE GENERATION-INDUCTIVELY COUPLED PLASMA-ATOMIC EMISSION-SPECTROMETRY, JPN J A P 1, 34(8A), 1995, pp. 3965-3969
Authors:
YANO F
HIRAOKA A
ITOGA T
KOJIMA H
KANEHORI K
MITSUI Y
Citation: F. Yano et al., X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF SUBMONOLAYER NATIVE OXIDES ON HF-TREATED SI SURFACES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(6), 1995, pp. 2671-2675
Authors:
SAIKI A
OSHIO R
SUZUKI M
TANAKA A
ITOGA T
YAMANAKA R
Citation: A. Saiki et al., DEVELOPMENT OF AMMONIA ADSORPTION FILTER AND ITS APPLICATION TO LSI MANUFACTURING ENVIRONMENT, JPN J A P 1, 33(5A), 1994, pp. 2504-2508
Authors:
HIRAIWA A
ITOGA T
Citation: A. Hiraiwa et T. Itoga, SCALING LAW IN ULSI CONTAMINATION CONTROL, IEEE transactions on semiconductor manufacturing, 7(1), 1994, pp. 60-67
Authors:
OKAMURA T
NIHO Y
ITOGA T
CHIBA S
MIYAKE M
KOTSURU M
SAITO H
TAKATSUKI K
TSUDA K
IGATA A
TANAKA K
Citation: T. Okamura et al., TREATMENT OF DISSEMINATED INTRAVASCULAR COAGULATION AND ITS PRODROMALSTAGE WITH GABAXATE MESILATE (FOY) - A MULTICENTER TRIAL, Acta haematologica, 90(3), 1993, pp. 120-124
Risultati:
1-14
|