Citation: Dh. Kwak et al., EFFECT OF RAPID THERMAL ANNEALING ON THE INTERFACE-TRAP DENSITY BETWEEN PT AND (BA,SR)TIO3 THIN-FILM, Integrated ferroelectrics, 17(1-4), 1997, pp. 179-186
Citation: Sy. Cha et al., IRIDIUM THIN-FILM AS A BOTTOM ELECTRODE FOR HIGH DIELECTRIC (BA,SR)TIO3 CAPACITORS, Integrated ferroelectrics, 17(1-4), 1997, pp. 187-195
Authors:
KWAK DH
JANG BT
CHA SY
LEE SH
LEE HC
YU BG
Citation: Dh. Kwak et al., HYSTERESIS ANALYSIS IN CAPACITANCE-VOLTAGE CHARACTERISTICS OF PT (BA,SR)TIO3/PT STRUCTURES/, Integrated ferroelectrics, 13(1-3), 1996, pp. 413-419