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SCHILTZ A
JOUBERT O
VALLIER L
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TORMEN B
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JOUBERT O
VALLIER L
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CALDES M
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JOUBERT O
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JOUBERT O
CZUPRYNSKI P
BELL FH
BERRUYER P
BLANC R
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Citation: Fh. Bell et O. Joubert, POLYSILICON GATE ETCHING IN HIGH-DENSITY PLASMAS .5. COMPARISON BETWEEN QUANTITATIVE CHEMICAL-ANALYSIS OF PHOTORESIST AND OXIDE MASKED POLYSILICON GATES ETCHED IN HBR CL-2/O-2 PLASMAS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(1), 1997, pp. 88-97
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JOUBERT O
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MONGET C
JOUBERT O
VALLIER L
BELL FH
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SAGNES I
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JOUBERT O
VALLIER L
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BLAYO N
Citation: S. Vallon et al., REAL-TIME ULTRAVIOLET ELLIPSOMETRY MONITORING OF GATE PATTERNING IN AHIGH-DENSITY PLASMA, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 865-870
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GOGLIO G
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VALLON S
BELL FH
VALLIER L
JOUBERT O
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Authors:
JOUBERT O
WEIDMAN TW
JOSHI AM
KOSTELAK RL
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WEIDMAN TW
VAIDYA S
JOUBERT O
PALMATEER SC
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