AAAAAA
Results:
1-8
|
Results: 8
Authors:
FLEMING JG
ROHERTYOSMUN E
SMITH PM
CUSTER JS
KIM YD
KACSICH T
NICOLET MA
GALEWSKI CJ
Citation: Jg. Fleming et al., GROWTH AND PROPERTIES OF W-SI-N DIFFUSION-BARRIERS DEPOSITED BY CHEMICAL-VAPOR-DEPOSITION, Thin solid films, 320(1), 1998, pp. 10-14
Authors:
KACSICH T
KOLAWA E
FLEURIAL JP
CAILLAT T
NICOLET MA
Citation: T. Kacsich et al., FILMS OF NI-7 AT-PERCENT V, PD, PT AND TA-SI-N AS DIFFUSION-BARRIERS FOR COPPER ON BI2TE3, Journal of physics. D, Applied physics (Print), 31(19), 1998, pp. 2406-2411
Authors:
KACSICH T
NIEDERDRENK M
SCHAAF P
LIEB KP
GEYER U
SCHULTE O
Citation: T. Kacsich et al., CHARACTERIZATION OF MAGNETRON-SPUTTERED CHROMIUM AND IRON NITRIDE FILMS, Surface & coatings technology, 93(1), 1997, pp. 32-36
Authors:
KACSICH T
LIEB KP
SCHAPER A
SCHULTE O
Citation: T. Kacsich et al., OXIDATION OF THIN CHROMIUM NITRIDE FILMS - KINETICS AND MORPHOLOGY, Journal of physics. Condensed matter, 8(49), 1996, pp. 10703-10719
Authors:
KACSICH T
NEUBAUER M
GEYER U
BAUMANN K
ROSE F
UHRMACHER M
Citation: T. Kacsich et al., DEPOSITION TEMPERATURE-DEPENDENT CHARACTERISTICS OF MAGNETRON-SPUTTERED CHROMIUM NITRIDE FILMS, Journal of physics. D, Applied physics, 28(2), 1995, pp. 424-431
Authors:
KACSICH T
LIEB KP
Citation: T. Kacsich et Kp. Lieb, OXIDATION OF THIN CRN AND CR2N FILMS ANALYZED VIA NUCLEAR-REACTION ANALYSIS AND RUTHERFORD BACKSCATTERING SPECTROSCOPY, Thin solid films, 245(1-2), 1994, pp. 4-6
Authors:
KACSICH T
WEBER T
BOLSE W
LIEB KP
Citation: T. Kacsich et al., XENON-BEAM-INDUCED ATOMIC TRANSPORT THROUGH CR AL AND CR2N/AL INTERFACES/, Applied physics. A, Solids and surfaces, 57(2), 1993, pp. 187-193
Authors:
KLOSE F
STEINS M
KACSICH T
FELSCH W
Citation: F. Klose et al., INTERFACE AND GROWTH-MODE CHARACTERIZATION OF CE FE AND CEH-APPROXIMATE-TO-2/FE MULTILAYERS BY X-RAY-DIFFRACTION AND RUTHERFORD BACKSCATTERING SPECTROSCOPY/, Journal of applied physics, 74(2), 1993, pp. 1040-1045
Risultati:
1-8
|