Authors:
KONONENKO OV
IVANOV ED
MATVEEV VN
KHODOS II
Citation: Ov. Kononenko et al., ELECTROMIGRATION ACTIVATION-ENERGY IN PURE ALUMINUM FILMS DEPOSITED BY PARTIALLY-IONIZED BEAM TECHNIQUE, Scripta metallurgica et materialia, 33(12), 1995, pp. 1981-1986
Authors:
KONONENKO OV
MATVEEV VN
KASUMOV AY
KISLOV NA
KHODOS II
Citation: Ov. Kononenko et al., THE EFFECT OF SELF-IONS BOMBARDMENT ON THE STRUCTURE AND PROPERTIES OF THIN METAL-FILMS, Vacuum, 46(7), 1995, pp. 685-690
Citation: Lk. Fionova et al., THE STRUCTURE AND ELECTROMIGRATION BEHAVIOR OF ALUMINUM FILMS DEPOSITED BY THE PARTIALLY IONIZED BEAM TECHNIQUE, Thin solid films, 227(1), 1993, pp. 54-58