Citation: Sa. Korenev et al., A PULSED HIGH-CURRENT ELECTRON-ION-CLUSTER SOURCE FOR THE DEPOSITION OF FILMS AND COATINGS, Surface & coatings technology, 109(1-3), 1998, pp. 265-270
Citation: Sa. Korenev et al., VERY HIGH-RATE COATING DEPOSITION WITH INTENSE ION AND OR ELECTRON-BOMBARDMENT/, Surface & coatings technology, 87-8(1-3), 1996, pp. 292-301
Citation: Sa. Korenev et Aj. Perry, SMALL PULSED ELECTRON-ION SOURCES FOR RADIATION TECHNOLOGIES AND SURFACE MODIFICATION OF MATERIALS, Vacuum, 47(9), 1996, pp. 1089-1092
Citation: Sa. Korenev, AN ELECTRON SOURCE WITH A BI-SR-CA-CU-O CERAMICS-BASED EXPLOSIVE-EMISSION CATHODE, Instruments and experimental techniques, 39(5), 1996, pp. 743-745
Authors:
KORENEV SA
BALYKIN NI
SIKOLENKO VV
ORELOVICH OL
SHIROKOV DM
Citation: Sa. Korenev et al., DEPOSITION OF FILMS WITH ION MIXING IN A PULSE EXPLOSIVE EMISSION DIODE, Instruments and experimental techniques, 38(3), 1995, pp. 411-416