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Results: 5

Authors: JOUBERT O WEIDMAN TW JOSHI AM KOSTELAK RL
Citation: O. Joubert et al., APPLICATION OF PLASMA-POLYMERIZED METHYLSILANE IN AN ALL DRY RESIST PROCESS FOR 193 AND 248 NM LITHOGRAPHY, Microelectronic engineering, 30(1-4), 1996, pp. 275-278

Authors: KOSTELAK RL WEIDMAN TW VAIDYA S JOUBERT O PALMATEER SC HIBBS M
Citation: Rl. Kostelak et al., APPLICATION OF PLASMA-POLYMERIZED METHYLSILANE RESIST FOR ALL-DRY 193NM DEEP-ULTRAVIOLET PROCESSING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2994-2999

Authors: KOSTELAK RL RAAB EL VAIDYA S
Citation: Rl. Kostelak et al., IMPACT OF LENS ABERRATIONS ON PHASE-SHIFTING MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3793-3798

Authors: GAROFALO J BIDDICK CJ KOSTELAK RL VAIDYA S
Citation: J. Garofalo et al., MASK ASSISTED OFF-AXIS ILLUMINATION TECHNIQUE FOR RANDOM LOGIC, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2651-2656

Authors: KOSTELAK RL PIERRAT C GAROFALO JG VAIDYA S
Citation: Rl. Kostelak et al., PRINTING OF PHASE-SHIFTING MASK DEFECTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2705-2713
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